Average Co-Inventor Count = 4.77
ph-index = 14
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Fujikin Inc. (114 from 435 patents)
2. Tokyo Electron Limited (12 from 10,148 patents)
3. Other (8 from 831,952 patents)
4. Tohoku University (5 from 958 patents)
5. Koganei Corporation (1 from 139 patents)
6. Tadahiro Ohmi (1 from 27 patents)
7. Connectec Japan Corporation (1 from 5 patents)
8. Fujikin Irc. (1 from 1 patent)
9. Fujikin Incorporation (1 from 1 patent)
10. Sasada Magnetics and Sensors Laboratory Co., Ltd. (1 from 1 patent)
11. Ohmi,tadahiro, Miyagi (1 from 1 patent)
121 patents:
1. 12326718 - Operation information collection system for fluid control device, fluid control device, operation information collection method for fluid control device, and computer executable program
2. 12209679 - Fluid control device, fluid supply system, and fluid supply method
3. 12135097 - Fluid control device
4. 12123517 - Valve, abnormality diagnosis method of valve
5. 12085186 - Valve and fluid control device with a magnetic indicator
6. 11988302 - Fluid control device, abnormality detection method of fluid control device, abnormality detection device, and abnormality detection system
7. 11960308 - Fluid control apparatus, fluid control device, and operation analysis system
8. 11927280 - Diaphragm valve and monitoring method thereof with improved leak detection
9. 11879560 - Flow-path forming block and fluid control device provided with flow-path forming block
10. 11873916 - Fluid control device, fluid supply system, and fluid supply method
11. 11774000 - Fluid control device and manufacturing method for the fluid control device
12. 11732818 - Electromagnetic valve, valve device, fluid control device, and electromagnetic valve replacement method
13. 11713819 - Valve device
14. 11669067 - Work management apparatus, work management method, and work management system
15. 11598430 - Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device