Daisan Kasei Co., Ltd

The University of Tokyo

Kisco

Tsutomu Mochizuki

Takashi Inoue

Hiroshi Kimura

Teruo Fujii

Hiroshi Maruyama

Yuki Tanabe

Hideto Tozawa

Yasuo Yoshimoto

Taku Oguni

Kentaro Kamimae

Makoto Hirama

Provided is: a cell culture membrane, which is free from materials derived from living organisms, can easily be industrially mass-produced, exhibits superior long-term storage properties and chemical resistance, has excellent cell adhesion properties and long-term culture properties and is capable of replicating a cell adhesion morphology that is similar to that of collagen derived from living organisms and being used for conventional cell cultivation. Also provided are a cell culture substrate, and a method for manufacturing the cell culture substrate. In the present invention, as a cell adhesion layer, a polymer membrane represented by formula (I) is formed on the base of a cell culture substrate so as to have a membrane thickness equal to or greater than 0.2 &#x3bc;m (in the formula, R1 and R2 represent a &#x2014;(CH)&#x2014;NHmoiety (n is an integer of 1-10 inclusive.) or H, with at least one of R1 and R2 being a &#x2014;(CH)&#x2014;NHmoiety. Moreover, l and m are positive integers expressing polymerization degree). 

Cell culture membrane, cell culture substrate, and method for manufacturing cell culture substrate

A method for improving the heat stability of polyparaxylylene and a derivative film thereof to improve the heat resistance of the polyparaxylylene and the derivative film thereof without deteriorating deposition characteristics or profitability, and a polyparaxylylene derivative whose heat resistance is improved are provided. When the polyparaxylylene or the derivative film thereof represented by a below-described general formula 1 is formed by a chemical vapor deposition method, an amino-(2.2)-paracyclophane compound represented by a below-described general formula 3 is mixed in a (2.2)-paracyclophane compound represented by a below-described general formula 2 to form a film. (In the formula 1, Xand Xdesignate hydrogen, lower alkyl or halogen. Xand Xmay be the same or different. n represents a degree of polymerization.) (In the formula 2, Xand Xhave the same meanings as those of the formula 1.) (In the formula 3, Xdesignates hydrogen or a lower alkyl group. Yand Ydesignate hydrogen or an amino group and both Yand Yare not hydrogens at the same time.)

Method for improving heat stability of polyparaxylylene and derivative film thereof and polyparaxylylene derivative

Growing community of inventors

Ichihara, Japan

Tsutomu Mochizuki