Asahi Kasei Microdevices Corporation

Tsutomu Miyazaki

Tsuyoshi Fujiwara

Daichi Matsumoto

Kiyohiko Satoh

A step of forming a stacked film serving as a lower electrode, a step of forming an insulating film serving as a capacitive film on the stacked film, and a step of patterning the insulating film and the stacked film are performed. In the step of forming the stacked film, a film containing titanium, a film containing titanium and nitrogen, a main conductive film containing aluminum, a film containing titanium, and a film containing titanium and nitrogen are sequentially formed from below. The ratio of the surface roughness of the upper surface of the stacked film to the thickness of the insulating film is 14% or less.

Growing community of inventors

Tokyo, Japan

Tsutomu Miyazaki