Tosoh Corporation

Plansee Se

Plansee Japan Ltd.

Plansee Shanghai High Performance Material Ltd.

Tsutomu Kuniya

Koichi Hanawa

Tomoyuki Oikawa

Hiroaki Hidaka

Hiroshi Tanaka

Chao Chen

Nobuyuki Suzuki

Akira Terashi

Hennrik Schmidt

Jiandong Lu

Christian Linke

Shinji Sekine

A sputtering target includes a tubular backing tube which has an axis which is defined as an axial direction, and a plane in which a radial direction lies is perpendicular to the axial direction. A cylindrical target segment is arranged on the tubular backing tube extends along the axial direction through at least 90% of length of the cylindrical target segment. A bonding material is arranged between the tubular backing tube and the target segment. The sputtering target includes a stop member for a target segment adjacent to the stop member, the stop member is monolithically formed with and radially protruding along the tubular backing tube at an axial end region of the tubular backing tube and extending along a part of a circumference of the tubular backing tube. A circumferential sealing member is inserted between the stop member and the target segment to prevent leakage of the bonding material.

Sputtering target

To provide a sputtering target structure which has good machinability and thermal conductivity and has good wettability with soldering materials, which is inexpensive and can be used repeatedly for a long period of time, and which is free from problems of cracking and peeling of the sputtering target therein, a sputtering target structure is formed by bonding a sputtering target and a backing plate. The backing plate is formed of a material that has the difference in the linear expansion coefficient between it and the sputtering target material of at most 2&#xd7;10/K, and a copper plate having a thickness of from 0.3 to 1.5 mm is disposed on at lest one face of the backing plate.

Method for manufacturing a sputtering target structure

A chromium weld material comprising chromium as a main component and either one of or an appropriate combination of elements selected from the group IVb metals of the periodic table, Al, metals belonging to the groups VIIb, VIII, and Ib of the periodic table, Nb, and Ta and, if desired, at least one of rare earth elements, a chromium rolled article comprising chromium as a main component and either one of or an appropriate combination of elements selected from Al, Ti, Zr, Hf, Y, rare earth elements, and elements belonging to the groups Vb, VIb, and VIIb of the periodic table, and a process for producing said rolled article by cross-rolling under specific temperature and output rate conditions are disclosed. The weld material provides a weld free from deterioration of mechanical characteristics. The rolled article exhibits excellent tensile characteristics. The process provides a rolled sheet of small thickness without causing craking.

Chromium-based weld material

Giant grains or single crystals of chromium and process for producing

Chromium-based weld material and rolled article and process for

A method for producing a single crystal of chromium is disclosed, comprising sintering a chromium molding to thereby apply thereto a thermal strain and heat treating the resulting thermally strained chromium molding. The method achieves high efficiency of crystal growth and produces a single-crystal chromium molding of complicated shape.

Single crystals of chromium and method for producing the same

Growing community of inventors

Kanagawa, Japan

Tsutomu Kuniya