United Microelectronics Corp.

Tsung-Yen Pan

Wai-Yi Lien

Yu-Ho Chiang

A dummy cell pattern includes a dummy diffusion pattern disposed within a predetermined region A; a trench isolation pattern encompassing the dummy diffusion pattern in the predetermined region A; a first dummy gate pattern disposed on the dummy diffusion pattern with two ends of the first dummy gate pattern extending above the trench isolation pattern, thereby forming overlapping areas Cand C; and a second dummy gate pattern directly on the trench isolation pattern forming an overlapping area C therebetween, wherein the combination of C, Cand C is about 5%-20% of the predetermined region A.

Growing community of inventors

Ping-Tung County, Taiwan

Tsung-Yen Pan