Taiwan Semiconductor Manufacturing Comp. Ltd.

Tsung-Yang Hsieh

Chia-Ping Lai

Cheng-Kang Huang

Wen-Chung Lu

Mei-Shih Kuo

Chen-Hua Douglas Yu

Shang-Yun Hou

Chi-Hsi Wu

Hsien-Pin Hu

Chien-Chang Lee

Li-Huan Chu

Wen-Hsin Wei

Shih-Wen Huang

Liang-Chen Lin

Chun Hua Chang

Hsu-Hsien Chen

Chih-Ching Lin

Chun-Che Chen

Hsin-Hsien Lee

Jhih-Ming Lin

Wen-Jung Chuang

Kuen-Hong Tsai

Alice Huang

Yu-Sheng Lin

Yao-Chun Chuang

Chin-Fu Kao

Jyun-Lin Wu

Chih-Ai Huang

A package comprises an interposer, comprising an interposer substrate including at least one layer, and a plurality of RDLs formed through at least a portion of the interposer substrate. The package also includes a die device structure comprising at least one device die, and a first test line (TL) structure interposed between the interposer and the die device structure. The first TL structure includes at least one first test line electrically coupled to the at least one device die, at least a portion of the at least one first test line extending beyond a peripheral edge of the die device structure to provide an electrical interface with the at least one device die.

Semiconductor package including test line structure

A first integrated circuit (IC) die includes a first substrate. A second IC die includes a second substrate. At least one of the first substrate or the second substrate has a first surface orientation. The first IC die is spaced apart from the second IC die. A third die electrically interconnects the first IC die to the second IC die. The third die includes a third substrate having a second surface orientation. The second surface orientation is different from the first surface orientation.

Bridge die having different surface orientation than IC dies interconnected by the bridge die

A method is provided for forming an integrated circuit (IC) chip package structure. The method includes: providing an interposer having a front surface and a back surface, the interposer comprising a substrate, at least one routing region, and at least one non-routing region; forming at least one warpage-reducing trench in the at least one non-routing region, wherein the at least one warpage-reducing trench extends from the front surface of the interposer to a first depth, the first depth smaller than a thickness between the front surface and the back surface of the interposer; depositing a warpage-relief material in the at least one warpage-reducing trench; and bonding the group of IC dies to the front surface of the interposer.

Interposer with warpage-relief trenches

A method is provided for forming an integrated circuit (IC) chip package structure. The method includes providing a substrate for an interposer, and forming a conductive interconnect structure in and on the substrate for connecting a group of selected IC dies. The method includes forming warpage-reducing trenches in non-routing regions of the interposer, wherein the warpage-reducing trenches are sized and positioned based on a warpage characteristic to reduce the warpage of the chip package structure. The method also includes depositing a warpage-relief material in the warpage-reducing trenches according to the warpage characteristic to reduce the warpage of the chip package structure, and bonding the group of selected IC dies to the interposer to form a chip package structure.

A package manufacturing process and semiconductor packages are provided. An interposer having a crystal structure is provided. A first die and a second die are bonded on the interposer. The second die is positioned to be spaced apart from the first die with a gap extending direction that is perpendicular to a shortest distance of the gap, and the gap extending direction is not parallel with a crystallographic orientation of the crystal structure of the interposer. A molding compound is formed over the interposer covering the first and second dies. The molding compound and the interposer are cut into packages.

Semiconductor package and manufacturing process thereof

An interposer substrate is manufactured with a scribe line between adjacent regions. In an embodiment a separate exposure reticle is utilized to pattern the scribe line. The exposure reticle to pattern the scribe line will create an exposure region which overlaps and overhangs the exposure regions utilized to form adjacent regions.

Semiconductor device and method of manufacture

Growing community of inventors

Taipei, Taiwan

Tsung-Yang Hsieh