Taiwan Semiconductor Manufacturing Comp. Ltd.

Tsung-Hao Yeh

Hsin Fu Lin

Hsin-Fu Lin

Harry-Hak-Lay Chuang

Shiang-Hung Huang

Chih-Wei Hung

Chien-Hung Liu

Kuo-Ching Huang

Kuo-Chyuan Tzeng

Wei-Cheng Wu

Ruey-Hsin Liu

Chia-Ta Hsieh

Chih-Chang Cheng

Yu-Wei Ting

Henry Wang

Chien Hung Liu

Kuo-Pin Chang

Tung-Yang Lin

Chang-Chih Huang

Han-Yu Chen

Hsien Jung Chen

HsinFu Lin

A dielectric isolation layer having a top surface may be formed over a substrate. A heater line, a phase change material (PCM) line, and an in-process conductive barrier plate may be formed over the dielectric isolation layer. An electrode material layer may be formed over the in-process conductive barrier plate. The electrode material layer and the in-process conductive barrier plate may be patterned such that patterned portions of the in-process conductive barrier plate include a first conductive barrier plate contacting a first area of a top surface of the PCM line, and a second conductive barrier plate contacting a second area of the top surface of the PCM line, and patterned portions of the electrode material layer include a first electrode contacting the first conductive barrier plate and a second electrode contacting the second conductive barrier plate.

Planarization-less phase change material switch

The present disclosure relates to a semiconductor structure that includes a well region and a semiconductor substrate. The well region is disposed within the semiconductor substrate. The well region includes a plurality of first regions separated by a plurality of second regions, where the plurality of first regions is of a first doping and the plurality of second regions are of a second doping different than the first doping. A gate electrode overlies the well region where the gate electrode is disposed laterally over a portion of the plurality of first regions and a portion of the plurality of second regions.

Integration of low and high voltage devices on substrate

Various embodiments of the present disclosure are directed towards an integrated chip. The integrated chip includes a well region disposed within a semiconductor substrate and comprises a first doping type. A gate electrode overlies the well region. A first contact region is disposed within the well region and comprises a second doping type opposite the first doping type. A second contact region is disposed within the semiconductor substrate and laterally offset from the well region. The second contact region comprises the first doping type and the gate electrode is disposed between the first contact region and the second contact region. A gate dielectric layer is disposed between the semiconductor substrate and the gate electrode, where a thickness of the gate dielectric layer is greater than about 140 Angstroms.

Diode with reduced current leakage

Various embodiments of the present disclosure are directed towards an integrated chip (IC). The IC comprises a substrate. A semiconductor device is disposed on the substrate. An interlayer dielectric (ILD) structure is disposed over the substrate and the semiconductor device. A first intermetal dielectric (IMD) structure is disposed over the substrate and the ILD structure. An opening is disposed in the first IMD structure, wherein the opening overlies at least a portion of the semiconductor device.

Integrated chip with good thermal dissipation performance

Phase change material (PCM) switches and methods of fabrication thereof that provide improved thermal confinement within a phase change material layer. A PCM switch may include a dielectric capping layer between a heater pad and the phase change material layer of the PCM switch that is laterally-confined such opposing sides of the dielectric capping layer the heater pad may form continuous surfaces extending transverse to the signal transmission pathway across the PCM switch. Heat transfer from the heater pad through the dielectric capping layer to the phase change material layer may be predominantly vertical, with minimal thermal dissipation along a lateral direction. The localized heating of the phase change material may improve the efficiency of the PCM switch enabling lower bias voltages, minimize the formation of regions of intermediate resistivity in the PCM switch, and improve the parasitic capacitance characteristics of the PCM switch.

Phase change material switch with improved thermal confinement and methods for forming the same

A semiconductor device includes a drift region, a dielectric film, and an anti-type doping layer. The drift region has a first type conductivity. The anti-type doping layer is located between the drift region and the dielectric film, and has a second type conductivity opposite to the first type conductivity so as to change a current path of a current in the drift region, to thereby prevent the current from being influenced by the dielectric film. A method for manufacturing a semiconductor device and a method for reducing an influence of a dielectric film are also disclosed.

Semiconductor device and method for manufacturing the same

A field effect transistor contains a semiconductor material layer including a source-side doped well, a source region, and a drain region. A shallow trench isolation structure is embedded in the semiconductor material layer and extends between the source region and the drain region. Agate dielectric layer overlies the semiconductor material layer. A horizontally-extending portion of a gate electrode overlies the gate dielectric layer, and at least one downward-protruding portion of the gate electrode extends downward from a bottom surface of the horizontally-extending portion into an upper region of the shallow trench isolation structure. The gate electrode is vertically spaced from a bottom surface of the shallow trench isolation structure modifies electrical field in a semiconductor channel to reduce hot carrier injection.

Field effect transistor including a downward-protruding gate electrode and methods for forming the same

A semiconductor device includes a semiconductor layer, a drift region, a source area, a well region, a drain area, and a dielectric film. The drift region and the source area are formed in the semiconductor layer. The well region is formed in the semiconductor layer and between the drift region and the source area. The drain area is formed in the drift region. The dielectric film is formed in the drift region and is located between the source area and the drain area. The dielectric film includes a proximate end portion and a distal end portion which are proximate to and distal from the source area, respectively, and which are asymmetrical to each other.

A layer stack including a first bonding dielectric material layer, a dielectric metal oxide layer, and a second bonding dielectric material layer is formed over a top surface of a substrate including a substrate semiconductor layer. A conductive material layer is formed by depositing a conductive material over the second bonding dielectric material layer. The substrate semiconductor layer is thinned by removing portions of the substrate semiconductor layer that are distal from the layer stack, whereby a remaining portion of the substrate semiconductor layer includes a top semiconductor layer. A semiconductor device may be formed on the top semiconductor layer.

Semiconductor-on-insulator (SOI) semiconductor structures including a high-k dielectric layer and methods of manufacturing the same

A semiconductor device includes a semiconductor layer and a gate structure on the semiconductor layer. The gate structure includes a multi-stepped gate dielectric on the semiconductor layer and a gate electrode on the multi-stepped gate dielectric. The multi-stepped gate dielectric includes a first gate dielectric segment having a first thickness and a second gate dielectric segment having a second thickness that is less than the first thickness.

An integrated circuit (IC) device comprises a high voltage semiconductor device (HVSD) on a frontside of a semiconductor body and further comprises an electrode on a backside of the semiconductor body opposite the frontside. The HVSD may, for example, be a transistor or some other suitable type of semiconductor device. The electrode has one or more gaps directly beneath the HVSD. The one or more gaps enhance the effectiveness of the electrode for improving the breakdown voltage of the HVSD.

High voltage device with boosted breakdown voltage

A semiconductor isolation structure includes a handle layer, a buried insulation layer, a semiconductor layer, a deep trench isolation structure, and a heavy doping region. The buried insulation layer is disposed on the handle layer. The semiconductor layer is disposed on the buried insulation layer and has a doping type. The semiconductor layer has a functional area in which doped regions of a semiconductor device are to be formed. The deep trench isolation structure penetrates the semiconductor layer and the buried insulation layer, and surrounds the functional area. The heavy doping region is formed in the semiconductor layer, is disposed between the functional area and the deep trench isolation structure, and is surrounded by the deep trench isolation structure. The heavy doping region has the doping type. A doping concentration of the heavy doping region is higher than that of the semiconductor layer.

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Hsinchu, Taiwan

Tsung-Hao Yeh