Globalfoundries Singapore Pte. Ltd.

Tsung-Che Tsai

Manjunatha Govinda Prabhu

Chai Ean Gill

Yohann Frederic Michel Solaro

Vaddagere Nagaraju Vasantha Kumar

Wei Gao

Vvss Satyasuresh Choppalli

Mahadeva Iyer Natarajan

Chien-Hsin Lee

Ruchil Kumar Jain

Xiangxiang Lu

Rudy Octavius Sihombing

Integrated circuits with electrostatic discharge (ESD) protection and methods of providing ESD protection in an integrated circuit are provided. An ESD protection circuit the ESD protection circuit may incorporate a transistor, such as a MOSFET, and a voltage limiter coupled to a gate of the transistor. The voltage limiter may be configured such that with an ESD disturbance on the voltage supply rail, Vdd, a gate voltage of the transistor of the ESD protection circuit is held below the supply voltage (Vdd) inducing base current, Isub, within the transistor to effectively shunt a current arising from the ESD event from the voltage supply rail Vdd to the voltage supply rail Vss.

Integrated circuit electrostatic discharge protection

Methods of forming a high voltage ESD GGNMOS using embedded gradual PN junction in the source region and the resulting devices are provided. Embodiments include a device having a substrate including a device region with an ESD protection circuit; a gate over the device region; a source region in the device region having a N+ implant and a P+ implant laterally separated on a first side of the gate; and a drain region in the device region on a second side of the gate, opposite the first.

ESD protection circuit and method of making the same

Methods to forming low trigger-voltage ESD protection circuit in FinFET IC devices and resulting devices. Embodiments include providing a substrate including a first-type well area in an ESD region; forming a base junction of the first-type along the perimeter of the ESD region; forming a shallow trench isolation (STI) region adjacent the base junction; forming alternate emitter and collector junctions of a second-type adjacent the STI region, parallel to and spaced from each other by parallel additional STI regions; forming at least one gate perpendicular to and over a collector junction; and forming a floating ESD nodes of the first-type in the collector junction adjacent one side of the at least one gate.

Methods for an ESD protection circuit including a floating ESD node

A method of forming a HV lateral PNP BJT with a pulled back isolation structure and a polysilicon gate covering a part of the NW+HVNDDD base region and a part of the collector extension (HVPDDD) and the resulting device are provided. Embodiments include forming a DVNWELL in a portion of a p-sub; forming a HVPDDD in a portion of the DVNWELL; forming a LVPW in a portion of the HVPDDD; forming a first and a second NW laterally separated in a portion of the DVNWELL, the first and second NW being laterally separated from the HVPDDD; forming a N+ base, a P+ emitter, and a P+ collector in an upper portion of the first and second NW and LVPW, respectively; forming a STI structure between the P+ emitter and P+ collector in a portion of the DVNWELL, HVPDDD, and LVPW, respectively; and forming a SAB layer over the STI structure.

High voltage PNP using isolation for ESD and method for producing the same

Electronic devices and methods of producing such electronic devices are provided. In an exemplary embodiment, a method of producing an electronic device includes forming a protected circuit and an ESD circuit, where the ESD circuit is configured to discharge an electrostatic discharge (ESD) to a ground such that the ESD bypasses the protected circuit. An ESD transistor is formed in the ESD circuit, where the ESD transistor includes a source and a drain. The ESD transistor also includes a gate with a gate width perpendicular to a gate length, where the gate length is measured across the gate from the source to the drain. A trigger voltage of the ESD transistor is set by adjusting the gate width.

Electronic devices with tunable electrostatic discharge protection and methods for producing the same

Integrated circuits and methods of producing such integrated circuits are provided. In an exemplary embodiment, an integrated circuit includes a deep well with a drain well overlying the deep well. A first source well also overlies the deep well, where the first source well includes a first source well concentration of conductivity determining impurities. A second source well overlies the first source well, where the second source well includes a second concentration of conductivity determining impurities that is higher than the first source well concentration. A drain overlies the drain well and a source overlies the second source well. A channel is defined between the source and the drain and a gate overlies the channel.

Integrated circuits with electrostatic discharge protection and methods for producing the same

Integrated circuits and methods of producing the same are provided. In an exemplary embodiment, an integrated circuit includes a substrate and a source in electrical communication with the substrate. A drain is also in electrical communication with the substrate. A gate overlies the substrate between the source and the drain, wherein a channel is defined within the substrate directly underlying the gate, and where a Schottky portion of the substrate is positioned between the channel and the source.

Integrated circuits having transistors with high holding voltage and methods of producing the same

Integrated circuits and methods of producing such integrated circuits are provided. In an exemplary embodiment, an integrated circuit includes a heavily doped source area having conductivity determining impurities at a heavily doped source concentration and a lightly doped drain area having conductivity determining impurities at a lightly doped drain concentration less than the heavily doped source concentration. A drain conductor directly contacts the lightly doped drain area, and a channel is positioned between the heavily doped source area and the lightly doped drain area. A gate overlies the channel.

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Singapore, Singapore

Tsung-Che Tsai