Lasertec Gmbh

Tsunehito Kohyama

Haruhiko Kusunose

Kiwamu Takehisa

Hironobu Suzuki

Hiroki Miyai

Masayasu Nishizawa

Keita Saito

Itaru Matsugu

Resolution is improved in a required direction while maintaining contrast in inspection of an anamorphic mask. A method for inspecting a mask with a reduction rate at the time of exposure in a longitudinal direction different from a reduction rate at the time of exposure in a lateral direction according to the present disclosure includes capturing an image of the mask using a photodetector including a rectangular pixel, a ratio of a dimension of the rectangular pixel in the longitudinal direction to a dimension of the rectangular pixel in the lateral direction being equal to an inverse ratio of the reduction rate in the longitudinal direction to the reduction rate in the lateral direction.

Mask inspection method and mask inspection apparatus

Provided are an optical device capable of effectively preventing contamination and a method for preventing contamination of the same. An optical device according to an embodiment includes a light source that generates light containing EUV (Extreme UltraViolet) light or VUV (Vacuum UltraViolet) light, a chamber in which an object to be irradiated with the light is placed, an optical element placed inside the chamber to guide the light, an introduction unit that introduces hydrogen or helium into the chamber, a power supply that applies a negative voltage to the optical element in the chamber, an ammeter that measures an ion current flowing through the optical element, and a control unit that adjusts the amount of the hydrogen or the helium introduced according to a measurement result of the ammeter.

Optical device, and method for preventing contamination of optical device

A correction method according to an embodiment includes illuminating an object to be inspected by using critical illumination by illumination light Lgenerated by a light source, concentrating light from the object to be inspected illuminated by the illumination light Land acquiring image data of the object to be inspected by detecting the concentrated light by a first detector, concentrating part of the illumination light L, and acquiring image data of a brightness distribution of the illumination light Lby detecting the concentrated illumination light Lby a second detector, and correcting the image data of the object to be inspected based on the image data of the brightness distribution.

Correction method, correction apparatus, and inspection apparatus

A detection method, an inspection method, a detection apparatus, and an inspection apparatus capable of preventing an error in a luminance unevenness correction and thereby accurately inspecting an object to be inspected are provided. A detection method according to the present disclosure includes illuminating an object to be inspected by using illumination light including pulsed light, acquiring image data of the object to be inspected by concentrating light from the object to be inspected illuminated by the illumination light and detecting the concentrated light by an inspection detector, acquiring image data of a luminance distribution of the illumination light, the luminance distribution being detected by illuminating a correction detector by using part of the illumination light, and detecting inspection image data by correcting the image data of the object to be inspected based on the image data of the luminance distribution.

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Yokohama, Japan

Tsunehito Kohyama