Wako Pure Chemical Industries, Inc.

Tokyo University of Science Foundation

Matsushita Electric Industrial Co., Ltd.

Fujifilm Corporation

Fujifilm Wako Pure Chemical Corporation

Tsuneaki Maesawa

Nobuhiro Ito

Kazushige Muto

Fumiyoshi Urano

Hironao Sajiki

Kosaku Hirota

Kuniaki Okamoto

Shinichi Komaba

Hirotoshi Fujie

Kazuo Shiraki

Naoaki Yabuuchi

Takeo Sasaki

Nobutaka Shimamura

Shota Hashimoto

Yasuyoshi Mori

Zhen-ji Han

Masaru Sasago

Masayuki Endo

Hiroki Sasaki

Motoshige Sumino

Hironori Mizuta

Masami Ishihara

Yoji Urano

Hiromi Kawada

Zhen-Ji Han

It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon. The present invention relates to 'a binder for a lithium cell, the binder comprising polyacrylic acid cross-linked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)'; a 'composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)'; and an &#x201c;electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)&#x201d;.

Binder for lithium cell, composition for producing electrode, and electrode

It is an object of the present invention to provide an electrode capable of maintaining superior capacity retention without destruction of an electrode structure, even in the case of using an active material including silicon. The present invention relates to 'a binder for a lithium cell, the binder comprising polyacrylic acid cross-liked by a cross-linking agent selected from the compounds described in the general formulae [1] to [13] and the polymer described in the general formula [14] (provided that the one which includes a functional group-containing vinylidene fluoride-based polymer is excluded)'; a 'composition for producing an electrode of a lithium cell, the composition comprising 1) an active material containing silicon, 2) a conductive assistant and 3) a cross-linked-type polyacrylic acid (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)'; and an &#x201c;electrode for a lithium cell, the electrode comprising 1) an active material containing silicon, 2) a conductive assistant, 3) a cross-linked-type polyacrylic acid, and 4) a current collector (provided that the one containing a functional group-containing vinylidene fluoride-based polymer is excluded)&#x201d;.

A cleaning agent is provided for a semiconductor substrate superior in corrosion resistance of a tungsten wiring or a tungsten alloy wiring, and superior in removal property of polishing fines (particle) such as silica or alumina, remaining at surface of the semiconductor substrate, in particular, at surface of a silicon oxide film such as a TEOS film, after a chemical mechanical polishing process; and a method for processing a semiconductor substrate surface. A cleaning agent for a semiconductor substrate is to be used in a post process of a chemical mechanical polishing process of the semiconductor substrate having a tungsten wiring or a tungsten alloy wiring, and a silicon oxide film, comprising (A) a phosphonic acid-based chelating agent, (B) a primary or secondary monoamine having at least one alkyl group or hydroxyalkyl group in a molecule and (C) water, wherein a pH is over 6 and below 7.

Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface

The subject of the present invention is to provide a method for deuteration, which can obtain a compound having an aromatic ring and/or a heterocyclic ring at an improved deuteration ratio. The present invention relates to a method for deuteration of a compound having an aromatic ring and/or a heterocyclic ring, comprising reacting the compound having an aromatic ring and/or a heterocyclic ring with a heavy hydrogen source in the presence of an activated mixed catalyst of not less than two kinds of catalysts selected from among a palladium catalyst, a platinum catalyst, a rhodium catalyst, an iridium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst.

Method of deuteration using mixed catalyst

The present invention relates to a method for deuteration of a compound having an aromatic ring, using an activated catalyst, and the method comprises reacting a compound having an aromatic ring with heavy hydrogen source in the presence of an activated catalyst selected from a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst.

Method for deuteration of an aromatic ring

The present invention relates to a method for deuteration of a heterocyclic ring, which comprises subjecting a compound having a heterocyclic ring to sealed refluxing state in a deuterated solvent in the presence of an activated catalyst selected form a palladium catalyst, a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst. In accordance with a method of the present invention, a hydrogen atom belonging to a heterocyclic ring of a compound having a heterocyclic ring can be very efficiently deuterated because temperature of deuteration reaction can be maintained at higher than boiling point of the solvent. Further, a method for deuteration of the present invention can be applied widely to deuteration of various compounds having a heterocyclic ring which are liable to decomposition under supercritical conditions or acidic conditions, leading to industrial and efficient deuteration of a compound having a heterocyclic ring.

Method for deuteration of a heterocyclic ring

A novel compound represented by a formula [1] wherein Rand Rrespectively represent a light or heavy hydrogen atom, Rrepresents a light or heavy hydrogen atom or a methyl group in which tree hydrogen atoms are respectively light or heavy hydrogen atoms, and Ris a norbornyl group provided that four or more hydrogen atoms in the norbornyl group are heavy hydrogen atoms; and a novel polymer produced by polymerization of a composition comprising the compound are disclosed. 

Heavy-hydrogenated norbornyl (meth)acrylates, process for producing them, polymers thereof and optical members

The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]: (wherein R and Aare as defined in claim).

Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition

The present invention relates to a resist composition for practical use with high resolution, high sensitivity, superior pattern profile and no outgas in energy irradiation under high vacuum, suitable to an ultra-fine processing technology represented by use of electron beam and the like, and provides: (1) a resist composition comprising at least one kind of polymer containing, as components thereof, a monomer unit represented by the following general formula [1]: a monomer unit represented by the following general formula [2]: and a monomer unit represented by the following general formula [3]: at least one kind of compound to generate an acid by irradiation of radioactive ray, represented by the following general formula [4]; an organic basic compound; and a solvent, (2) the resist composition in accordance with (1), further containing a polymer unit represented by the following general formula [13]: and, (3) the resist composition in accordance with (1) and (2), further containing a compound represented by the following general formula [4]: as a compound to generate an acid by irradiation of radioactive ray.

Resist compositions

The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, Useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: and Ris an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: and a polymerization initiator or an acid generator, comprising said onium salt.

Hybrid type onium salt

Resist Composition

Resist composition

To provide a polymer comprising as a structural unit a monomer unit containing a hydroxy group or other hydrophilic radical and other functional group in the molecule which is useful in medical, cosmetic and electric industries. A polymer comprising as a structural unit a monomer unit shown by the general formfula [1] ##STR1## (wherein R.sup.1 and R.sup.2 are, independently, a hydrogen atom or a halogen atom, R.sup.3 is a hydrophilic radical and R.sup.4 is a cyano group or a carboxyl group which may he esterified).

Functional polymers

An azoamide compound of the formula: ##STR1## wherein R.sup.1 through R.sup.4 are independently an alkyl group; X is an alkylene groupl Y is --O-- or --NH--; and n is an integer of 2 or more, is effective for producing a macroazo compound, which is a useful initiator for producing block copolymers.

Macroazo compound, a process for its production, a macroazo initiator,

An azoamide compound of the formula: ##STR1## wherein R.sup.1 through R.sup.4 are independently an alkyl group; X is an alkylene group; Y is --O-- or --N--; and n is an integer of 2 or more, is effective for producing a macroazo compound, which is a useful initiator for producing block copolymers.

Growing community of inventors

Kawagoe, Japan

Tsuneaki Maesawa