Nikon Corporation

Niko Corporation

Tsukasa Kishiume

Yusuke Taki

Koichiro Iwahori

An amount of nitrogen in a compound film is controlled. A method of manufacturing compound film comprising forming films laminated on a substrate placed at a film forming chamber is provided. According to the method of manufacturing compound film, a first compound layer including one or more elements selected from metal elements and semimetal elements and oxygen element and a second compound layer including one or more elements and nitrogen element are laminated alternately. The first compound layer is formed by a Filtered Arc Ion Plating method and the second compound layer is formed by a sputtering method.

Method of manufacturing compound film

A functional film that is applied to a surface of a medical apparatus or a biomaterial includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).

Functional film

A functional film which is applied to a surface of a base material includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).

Growing community of inventors

Kawasaki, Japan

Tsukasa Kishiume