Gigaphoton Inc.

Komatsu Corporation

Other

Ushio Denki Kabushiki Kaisha

Tsukasa Hori

Osamu Wakabayashi

Tatsuya Yanagida

Yutaka Shiraishi

Fumio Iwamoto

Kouji Kakizaki

Hakaru Mizoguchi

Takanobu Ishihara

Takayuki Yabu

Yoshifumi Ueno

Junichi Fujimoto

Akira Sumitani

Akira Endo

Hideo Hoshino

Toshihiro Nishisaka

Hiroshi Komori

Takashi Saito

Toshiyuki Hirashita

Hirotoshi Inoue

Shinya Ikesaka

Toshiro Umeki

Masaki Nakano

Yukio Watanabe

Hiroshi Someya

Kiwamu Takehisa

Teiichirou Chiba

Takashi Matsunaga

Hiroshi Umeda

Hirokazu Hosoda

Yoshiaki Kurosawa

Tatsuo Enami

Takuya Ishii

Shinji Okazaki

Kazukiyo Kamikanna

Katsutomo Terashima

Tomohide Ichinose

A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.

Target supply device, extreme ultraviolet light generating apparatus, and electronic device manufacturing method

A target supply device may include a first containing member configured to contain a target substance; a second containing member configured to contain the target substance flowing from the first containing member; a ring-shaped sealing portion which is formed integrally with one of the first containing member and the second containing member, and is brought into close contact with the other containing member; and a fastening member which fastens the first containing member and the second containing member to each other so that the first containing member communicates with the second containing member through the communication portion, and presses the sealing portion against the other containing member. Here, the sealing portion being plastically deformed by being pressed against the other containing member by the fastening member to seal a gap between the first containing member and the second containing member around the communication portion due to the plastic deformation.

Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

Target supply device, target supply method, and electronic device manufacturing method

A target supply device may include a first container configured to contain a solid target substance; a second container including a first connection port connected to the first container, a second connection port connected to a first pressurized gas supply line, and a third connection port connected to a target substance lead-out path; a moving body including a first recessed portion configured to contain the solid target substance supplied from the first container and move the first recessed portion inside the second container to cause an opening of the first recessed portion to be overlapped sequentially with the first to third connection ports; a third container connected to both a second pressurized gas supply line and the target substance lead-out path and configured to melt the solid target substance supplied from the third connection port; and a nozzle configured to output the melted target substance supplied from the third container.

A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

Laser apparatus and EUV light generation system

A chamber device according to one aspect of the present disclosure includes a chamber inside which plasma is generated, a light source, and an incidence window configured to transmit light emitted from the light source to the inside of the chamber. The incidence window includes a first surface facing the outside of the chamber, and a second surface facing the inside of the chamber. At least the second surface is not coated with an anti-reflection film. The second surface is disposed in a state of being inclined at a non-perpendicular angle against an optical axis of the light emitted from the light source.

Chamber device and extreme ultraviolet light generating device

A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.

Target supply device, target material refining method, recording medium having target material refining program recorded therein, and target generator

An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.

Extreme UV light generation device

An extreme ultraviolet light generation device may include a chamber in which a target is irradiated with laser light and extreme ultraviolet light is generated, and a target supply unit configured to eject a target into the chamber. The target supply unit may be provided with a nozzle member including an ejection face having an ejection port configured to eject the target into the chamber. An angle &#x3b8;defined by the ejection face and the gravity axis may satisfy a condition of '0 degrees&#x3c;&#x3b8;&#x3c;90 degrees'.

Extreme ultraviolet light generation device

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

System and method for generating extreme ultraviolet light

A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

Target supply device, processing device and processing method therefor

A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.

Filter and target supply apparatus

Target supply device, processing device and processing method thefefor

Growing community of inventors

Oyama, Japan

Tsukasa Hori