Taiwan Semiconductor Manufacturing Comp. Ltd.

Tsinghua University

Tsui-Wei Wang

Chui-Ya Peng

Yung-Li Tsai

Liang-Chor Chung

Chuin-Tih Yeh

Yuh-Jeen Huang

In an embodiment, a system includes: a wafer support configured to secure a wafer; a nozzle configured to dispense a liquid or a gas on the wafer when the nozzle is in an active state of dispensing; a shutter configured to catch the liquid from the nozzle when the shutter is in a first position below the nozzle; and a shutter actuator configured to: move the shutter to the first position in response to the nozzle not being in an inactive state; move the shutter to a second position away from the first position in response to the nozzle being in the active state.

Systems and methods for shuttered wafer cleaning

In an embodiment, a system includes: a first robotic arm configured to transport a wafer into a cleaning chamber, wherein the first robotic arm comprises a first hood that substantially covers the wafer when transported on the first robotic arm; the cleaning chamber configured to clean the wafer; a second robotic arm configured to transport the wafer out of the cleaning chamber, wherein the second robotic arm comprises a second hood that substantially covers the wafer when transported on the second robotic arm, wherein the second robotic arm is different than the first robotic arm.

Systems and methods for dry wafer transport

A process for hydrogen production at lower temperature by using Mn/ZnO, Cu/MnO, Cu/CeO, CuCe/ZnO and/or CuMn/ZnO catalysts, wherein a partial oxidization of methanol (POM) process can be initiated at an ambient reactor temperature lower than 100&#xb0; C. and then undertaken at a reaction temperature lower than 200&#xb0; C., and wherein POM process not only generates hydrogen rich gas (HRG) containing 4% CO or less but also generates 1.8 moles hydrogen or more per 1 mole methanol consumed.

Growing community of inventors

Hsinchu, Taiwan

Tsui-Wei Wang