United Microelectronics Corp.

Fujian Jinhua Integrated Circuit Co., Ltd.

Powerchip Semiconductor Corporation

Tsai-Yu Huang

Pin-Yao Wang

Sheng Hsun Wu

An antifuse device is disclosed. The antifuse device includes a plurality of active regions, a plurality of word lines extending along a first direction and cut through the active regions, a plurality of bit lines and a plurality of source lines extending along a second direction and stride across the active regions. The bit lines and the source lines are arranged alternatively along the first direction. Plural antifuse capacitors are disposed along the source lines and connected between the source lines and the active regions.

Antifuse device and method of operating the same

A set of test key layout including multiple test keys and method of monitoring layout pattern misalignments using the test keys is provided. Each test key is composed of a testing electrode, an operating voltage (V) line and a grounding voltage (V) line, wherein the patterns of test keys are defined by an overlapped portion of a first exposure pattern and a second exposure pattern, and the position of testing electrode is shifted sequentially in one direction in order of the test keys.

Test key layout and method of monitoring pattern misalignments using test keys

The memory cell includes a read selection transistor, a program selection transistor, and an anti-fuse capacitor. The read selection transistor has a first terminal coupled to a bit line, a second terminal, and a control terminal coupled to a read word line. The program selection transistor has a first terminal coupled to the second terminal of the read selection transistor, a second terminal coupled to a high voltage control line, and a control terminal coupled to a program word line. The anti-fuse capacitor has a first terminal coupled to the second terminal of the read selection transistor, and a second terminal coupled to a low voltage control line.

Memory cell with a read selection transistor and a program selection transistor

An active region structure includes a device region, an active layer and a shallow trench isolation (STI) layer. The device region is defined on a substrate. The active layer is formed by a top portion of the substrate and has a plurality of device cells within the device region and a border structure surrounding the device region. The border structure has at least one branch extending into the device region and is between a portion of the device cells. The STI layer has a first part formed within the border structure to insulate the device cells from one another and a second part surrounding an outer periphery of the border structure. The second part of the STI layer isolates the device cells from a peripheral active region.

Active region structure and forming method thereof

A split gate flash memory cell includes a substrate having a device isolation structure; a selective gate structure disposed on the substrate; an interlayer dielectric layer having an opening disposed on the substrate, wherein the opening exposes a portion of the selective gate structure, the substrate and the device isolation structure; a floating gate disposed in the opening and extended to cover a surface of the interlayer dielectric layer; a tunneling dielectric layer disposed between the floating gate and the selective gate structure; a gate dielectric layer disposed between the floating gate and the control gate; a source region disposed in the substrate on one side of the control gate that is not adjacent to the selective gate structure, and a drain region disposed in the substrate on one side of the selective gate that is not adjacent to the control gate.

Growing community of inventors

Hsinchu County, Taiwan

Tsai-Yu Huang