Tsinghua University

Other

Industrial Technology Research Institute

Prodisc Technology Inc.

Tsai-Chu Hsiao

Der-Ray Huang

Shiuh Chao

Wen-Yih Liao

Chien-Liang Huang

Don-Yau Chiang

Chin-Sen Chen

Jyh-Shin Chen

Lii-Chyuan Tsai

An optical information storage medium includes a first substrate, a first recording layer, a first reflective layer, a spacer layer, a second recording layer, a second reflective layer, and a second substrate. In this case, the first recording layer is disposed above the first substrate. The first reflective layer is disposed above the first recording layer. The spacer layer is disposed above the first reflective layer. The second recording layer is disposed above the spacer layer, and the second recording layer is made of an inorganic material. The second reflective layer is disposed above the second recording layer. The second substrate is disposed above the second reflective layer.

Optical information storage medium and method for manufacturing the same

A structure of an optical recording medium that mainly includes a first dielectric layer, a dye layer, a second dielectric layer, and a reflective layer formed on a substrate in sequence, and a method for fabricating an optical recording medium of the foregoing structure. The additional dielectric layers of the optical recording medium, instead of a quencher used in a conventional optical recording medium, increase the lifetime of a dye layer and reduce the fabrication cost. Furthermore, the additional dielectric layers are capable of isolating the dye layer from oxygen and moisture to enhance the lightfastness of the dye layer.

Optical recording medium

An apparatus for coating a magneto-optical recording medium film onto a disk substrate are provided. For proceeding the sputtering processes, a sputtering target containing Tb, Fe, and Co composition is prepared and placed in a sputtering gun which is served as a sputtering source. Facing to the sputtering gun, a clamping mechanism having a plurality of clampers arranged around the clamping mechanism is provided for clamping disk substrate thereon. During sputtering processes, the clamping mechanism is rotated about its axial center, and at the same time each clamper of the clamping mechanism is rotated about its axial center respectively. The clamper is designed in a form of facing the plane of the sputtering gun at a proper tilt angle, preferably 15 degrees, so that the disk substrate may be sputtered with a uniform thickness and composition of magneto-optical recording medium film thereon.

Apparatus for simultaneously coating a film of magneto-optical recording

A polarized-light scatterometer for measuring the thickness of a film coated on the partial of a substrate, the film having a straight line edge on the surface of the substrate coated with the film. The polarized-light scatterometer is composed of means for generating an incident beam (a fixed polarization state input beam) striking the straight line edge of the film; means for detecting the intensity of a scattered beam which is scattered by the incident beam within a predetermined angular range; means for rotating the detecting means about the Z-axis within the predetermined angular range; means for adjusting the intensity of the scattered beam; means for obtaining the Mueller matrix by using the Bickel-Bailey method; means for normalizing all the elements of the Mueller matrix; means for recording the corresponding scattered angle of the scattered beam having maximum intensity variation; means for obtaining the relation diagrams between the normalized elements and the thickness of the film respectively, and all the relation diagrams are obtained under the scattered angle having maximum intensity variation; means for choosing the relation diagrams that the normalized elements have greater sensitivity to the thickness of the film; means for obtaining the values of normalized elements of an unknown thickness of the same film; means for obtaining the thicknesses of the film of unknown thickness corresponding to the relation diagrams by using the values of the normalized elements; and means for determining the thickness of the unknown thickness film by choosing common thickness among the relation diagrams.

Polarized-light scatterometer for measuring the thickness of a film

Growing community of inventors

Chung-Li, Taiwan

Tsai-Chu Hsiao