Tokyo Electron Limited

Intel Corporation

Tri Thanh Khuong

Wei Liu

Junwei Bao

Hong Qiu

Sachin Deshpande

Jeffrey Alexander Chard

Ying Zhu

Pranav Sheth

Chandrasekaran Sakthivel

Kamalakar V Pawar

An apparatus and method are described for using a touch screen device to control an external display. For example, one embodiment of an apparatus comprises a touch screen to receive user touch input and display images; a processor communicatively coupled to the touch screen; a wireless session management module to establish and maintain a wireless display connection with an extended screen responsive to commands from the processor; and the processor to execute a process responsive to the user touch input to transform the touch screen or a portion thereof to a remote control touchpad device usable to provide control functions for content displayed on the extended screen.

Virtual touch pad method and apparatus for controlling an external display

In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

Parallel profile determination in optical metrology

A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

Parallel profile determination for an optical metrology system

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San Jose, CA, United States of America

Tri Thanh Khuong