Nippon Steel & Sumikin Materials Co., Ltd.

Nippon Steel Materials Co., Ltd.

Toyoshi Ogura

Yuji Kubo

Noriko Yamada

Shuji Nagasaki

Sawako Ito

An insulating film-coated metal foil having on one or both surfaces thereof an organic-inorganic hybrid layer containing dimethylsiloxane and a metalloxane comprising a metal other than Si. Relative to the concentration [Si]of the Si at a depth of &#xbc;t from the surface of the organic-inorganic hybrid layer in the thickness direction of the hybrid layer, the concentration [Si]of the Si at a depth of &#xbe;t from the surface of the organic-inorganic hybrid layer in the thickness direction of the hybrid layer satisfies [Si]&#x3c;[Si], and ([Si]&#x2212;[Si])/[Si]is 0.02-0.23. Provided is a metal foil that can be used in solar cell substrates, flexible circuit substrates, etc., that exhibits surface flatness, pliability, insulating properties and thermal resistance properties, and that has a layer having a surface which is not susceptible to scratching by processes in which substrates are handled, such as conveyance and transshipment.

Insulating film-coated metal foil

The present invention provides stainless steel foil for flexible display use which enables fabrication of a TFT substrate for display use which is superior in shape recovery after being rolled up or bent and which is high in surface flatness and is characterized by having a thickness of 20 &#x3bc;m to 200 &#x3bc;m, a surface roughness Ra of 50 nm or less, and a shape recovery of a distortion angle of 10&#xb0; or less after being wound around a 30 mm diameter cylinder.

Stainless steel foil for flexible display use

A coating solution for forming a flat-surface insulating film, which is a coating solution obtained by dissolving a poly(diorgano)siloxane A having a mass average molecular weight of 900 to 10,000 and a metal alkoxide B in an organic solvent C and further adding water, wherein the molar ratio A/B of the poly(diorgano)siloxane A to 1 mol of the metal alkoxide B is from 0.05 to 1.5, the organic solvent C has a hydroxyl group, the solubility of water in 100 g of the organic solvent C is from 3 to 20 g, and the molar ratio C/A of the organic solvent C to 1 mol of the poly(diorgano)siloxane A is from 0.05 to 100. This coating solution for forming a flat-surface insulating film ensures that an organic modified silicate composed of a poly(diorgano)siloxane and a metal alkoxide can be formed as a thick film having 1 &#x3bc;m or more and can be an organic modified silicate insulating film causing no irregularities due to phase separation and having a low Young's modulus and flexibility high enough to follow the deformation of a substrate board, as well as high film surface flatness allowing for mounting of microcomponents of an electronic device or the like.

Coating solution for forming flat-surface insulating film, flat-surface insulating film-coated substrate, and production method of a flat-surface insulating film-coated substrate

Growing community of inventors

Tokyo, Japan

Toyoshi Ogura