Fujikin Inc.

Other

Tokyo Electron Limited

Toyomi Uenoyama

Nobukazu Ikeda

Kouji Nishino

Kazuhiko Sugiyama

Ryousuke Dohi

Tadahiro Ohmi

Michio Yamaji

Atsushi Matsumoto

Akihiro Morimoto

Takashi Hirose

Jun Hirose

Yukio Minami

Hiroshi Koizumi

Eiji Ideta

Tomio Uno

Satoshi Kagatsume

Hideki Nagaoka

Katsunori Yonehana

Kazuo Fukazawa

Eiji Takahashi

Katsuyuki Sugita

Ryosuke Dohi

Shoichi Hino

Makoto Saegusa

The invention supplies a quantity Q of gas while dividing at flow rate ratio Q/Qfrom a gas supply facility equipped with a flow controller. A total quantity Q=Q+Qof gas is supplied into a chamber at flow rate Qand Qthrough shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GLand GL, respectively, to supply the specified quantity of gas from the gas supply facility, and by utilizing bypass line BLon the downstream side of the open/close valve OVand branched from GL, bypass line BLon the downstream side of the open/close valve OVand branched from GL, pressure type division quantity controller connected to the bypass line BLand the bypass line BL, a sensor measuring pressure inside branch supply line GL, and another sensor measuring pressure inside branch supply line GL

Device and method for supplying gas while dividing to chamber from gas supplying facility equipped with flow controller

The invention supplies a quantity Q of gas while dividing at flow rate ratio Q/Qfrom a gas supply facility equipped with a flow controller. A total quantity Q=Q+Qof gas is supplied into a chamber at flow rate Qand Qthrough shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GLand GL, respectively, to supply the specified quantity of gas from the gas supply facility, and by utilizing bypass line BLon the downstream side of the open/close valve OVand branched from GL,bypass line BLon the downstream side of the open/close valve OVand branched from GL,pressure type division quantity controller connected to the bypass line BLand the bypass line BL,a sensor measuring pressure inside branch supply line GL,and another sensor measuring pressure inside branch supply line GL

The invention provides an automatic zero point correction device that includes a pressure sensor, wherein output from the sensor is outputted and the sensor output is inputted to a time-varying zero point drift correction means of the sensor; a sensor output judgement means of the time-varying zero point drift correction means, wherein the sensor output judgement means operates to make a judgement determining whether the sensor output is larger than a set value; and operating condition judgement means of the time-varying zero point drift correction means, wherein the operating condition judgement means judges operating conditions of the sensor, wherein the time-varying zero point drift correction means operates to cancel time-varying zero point drift of the sensor when the sensor output judgement means determines sensor output is larger than the set value and the operating condition judgement means determines operating conditions of the sensor are within previously set operating conditions.

Automatic zero point correction device for a pressure sensor, a pressure control device and a pressure type flow rate control device

A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q/Qaccurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q/Qfrom a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FVand FVare provided in the plurality of branch supply lines GLand GL. Opening control of both division quantity controllers FVand FVis started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P' and P&#x2033; on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q+Qof gas while dividing into the chamber C through orifice holes () made in shower plates () at desired division quantities Qand Qrepresented by formulas Q=CP&#x2032; and Q=CP&#x2033; (where, Cand Care constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).

Method of supplying divided gas to a chamber from a gas supply apparatus equipped with a flow-rate control system

A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &#x394;t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus

A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Growing community of inventors

Osaka, Japan

Toyomi Uenoyama