Canon Kabushiki Kaisha

Tosiya Asano

Keiji Emoto

Junichi Seki

Atsushi Kimura

Yugo Shibata

Yuichiro Oguchi

Tetsuji Okada

Kota Nakano

Naoki Maruyama

Ryuichi Ebinuma

Noriyasu Hasegawa

Setsuo Yoshida

Takahiro Yoshida

Mitsuhiro Furumoto

An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.

Imprint apparatus and article manufacturing method

The present invention provides a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member into contact with a second member and forming a film of the curable composition in a space between the first member and the second member, wherein for each of the plurality of droplets of the curable composition, a distance from a representative point of the droplet to a point on a contour of the droplet is obtained so as to match the area of the inner region of the contour to an area of the droplet obtained from a volume of the droplet and a distance between the first member and the second member in accordance with a change of the distance between the first member and the second member.

Simulation method, simulation apparatus, storage medium, film forming method, and method of producing cured product

A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.

Control device, lithography apparatus, measurement apparatus, processing apparatus, planarizing apparatus, and article manufacturing method

There is provided a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on one of a first member and a second member into contact with an other of the first member and the second member and forming a film of the curable composition on the first member. The method includes generating a link by connecting two adjacent representative points of the plurality of droplets, generating a cell as a closed region formed by a plurality of links, and determining, based on the presence/absence of merging of droplets corresponding to each link forming the cell, whether a bubble is formed in the cell.

Simulation method, simulation apparatus, and storage medium

Control device for generating a control deviation via machine learning

The present invention provides a forming apparatus that forms a composition on a substrate using a mold including a contact region to be brought into contact with the composition, comprising: a deformation unit configured to deform the contact region; and a controller configured to perform, for each of a first shot region and a second shot region on the substrate, a process of bringing the contact region and the composition on the substrate into contact with each other while controlling the deformation of the contact region, wherein an area where the mold faces the substrate during the process is different between the first and second shot regions, and wherein the controller is configured to change, between the first and second shot regions, a process condition for bringing the contact region and the composition into contact with each other.

Forming apparatus and method of manufacturing article

An imprint apparatus forms a pattern on an imprint region of a substrate by bringing a mold into contact with an imprint material on the imprint region and curing the imprint material. The apparatus includes a controller for controlling an alignment operation of adjusting relative position between the mold and the imprint region in a state that the mold is in contact with the imprint material. The alignment operation includes a translation operation of performing relative translation between the imprint region and the mold, and a rotation operation of performing relative rotation between the imprint region and the mold. The rotation operation includes a first operation and a second operation, and a relative rotation direction between the imprint region and the mold in the second operation is opposite to a relative rotation direction between the imprint region and the mold in the first operation.

Imprint apparatus, imprint method, method of manufacturing article

The present invention provides an imprint apparatus which forms a pattern in an imprint material on a shot region of a substrate by using a mold, the apparatus comprising a stage that can move while holding the substrate, and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.

Imprint apparatus and method of manufacturing article

An imprint apparatus includes: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to obtain, in an imprint process on a shot region different from a target shot region, information relating to a relative position, between the other shot region and the mold, used for aligning the other shot region after bringing the mold and the imprint material into contact with each other, and, when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region and the obtained information.

Imprint apparatus, imprint method, and article manufacturing method

The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.

The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.

Lithography apparatus, and method of manufacturing article

The present invention provides a vibration suppression apparatus which includes a first object elastically supported on a base, a second object elastically supported on the first object, and a driving unit configured to drive the first object, and which suppresses a vibration of the second object, comprising a first generation unit configured to generate a first signal, a second generation unit configured to generate a second signal, and a control unit configured to control the driving unit, wherein the control unit controls the driving unit based on the first signal, and after the deviation between the relative distance between the base and the first object, and the first reference distance falls within an allowable range, the control unit controls the driving unit based on the first signal and the second signal.

Vibration suppression apparatus and vibration suppression method

An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver.

Exposure apparatus having a vibration suppressing feature and method of manufacturing device using the exposure apparatus

A positioning apparatus includes a stage, a base, a supporting mechanism which is arranged between the stage and the base and supports the stage with a supporting portion having a spring characteristic, an actuator which is arranged between the stage and the base so as to drive the stage, and a controller which controls the actuator so as to reduce a position error of the stage relative to a target position and cancel at least part of a force acting on the stage due to the spring characteristic of the supporting portion, based on the position error of the stage and a variation of a relative position between the stage and the base.

Positioning apparatus, exposure apparatus and device manufacturing method

The present invention provides an anti-vibration apparatus including an anti-vibration base, a plurality of supporting mechanisms configured to support the anti-vibration base, a plurality of actuators configured to apply a force to the anti-vibration base, an obtaining unit configured to obtain vibration data which represents vibrations on the anti-vibration base, a first calculation unit configured to calculate, based on the vibration data obtained by the obtaining unit, a force to be applied to the anti-vibration base so as to reduce the vibrations on the anti-vibration base, and a distribution unit configured to distribute the force calculated by the first calculation unit to forces to be applied by the plurality of actuators to the anti-vibration base.

Growing community of inventors

Utsunomiya, Japan

Tosiya Asano