Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Toshiyuki Suemitsu

Masahide Yokoyama

Naotaka Hashimoto

Yuuji Omata

Takahiro Kitai

Isamu Aokura

Hitoshi Yamanishi

Eiji Ohno

Hiroshi Sakakima

Masahiro Yamamoto

Hidehiro Yoshida

Koichi Osano

Kumio Nago

Hiroshi Hayata

Takahiro Takisawa

Nobuyuki Mori

Seiichiro Mori

Seiji Nakashima

Provided is a top emission type organic EL display, more specifically, an organic EL display having a specific sealing film and improved light extracting efficiency. The organic EL display provided with a top emission type organic EL element having the sealing film including a transparent inorganic material is characterized in that the density of a transparent inorganic material for an inner layer of the sealing film is lower than the density of a transparent inorganic material for an outer layer of the sealing film. The transparent inorganic material is silicon oxide, silicon nitride, silicon oxynitride, aluminum nitride or the like. Thus, the low power consumption organic EL display is provided.

Organic EL display and method for manufacturing same

The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids.

Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation

The plasma processing apparatus includes a substrate table,that extends from a wall of the vacuum chamber,toward the inside of the vacuum chamber,. A rotary holder,, to which the substrate,is mounted, is arranged in a concave portion,that is provided in the substrate table,. The rotary holder,is rotatably supported with its periphery being sealed with a sealing member,. Blades,are provided inside the rotary holder,. A supply port,and a drainage port,, for supplying and draining a fluid such that a rotation force is exerted on the blades,, are formed in the substrate table,. Supplying a fluid through the supply port,cools the substrate,while causing it to rotate.

Plasma processing apparatus

A magnetron sputtering apparatus has a plurality of ring-shaped flat targets with different diameters disposed about one center axis. The apparatus includes magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an inner circumferential edge thereof, and magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an outer circumferential edge thereof. The magnets placed along the inner and outer circumferential edges are placed in such a way that the magnets along the inner circumferential edge and the magnets along the outer circumferential edge become opposite in polarity to each other.

Magnetron sputtering apparatus and method

A magnetron sputtering electrode assembly which is used in a sputtering system having a rectangular flat-plate target, includes permanent magnets arranged along the longitudinal edges of the target to pass lines of magnetic forces in parallel to the surface of the rectangular flat-plate target, and a driving device for reversing polarity of the magnets to change by 180 degrees the direction of the lines of magnetic force caused by the permanent magnets passing in parallel to the surface of the rectangular flat-plate target.

Sputtering electrode

The method of the invention provides a soft magnetic film having a high saturation magnetic flux density and an anisotropy of high magnetic permeability suitable for use in various types of magnetic heads at a high production yield by use of a sputtering apparatus provided with a sputtering electrode, which has permanent magnets arranged above a target 1 mainly of Fe or Co in such a way that lines of magnetic force 3 generated by said permanent magnets are in parallel to the surface of said target 1 and to the center line of said target 1 and have a magnetic strength pattern symmetric with respect to said center line while the lines of magnetic force to the right of said center line are of a reverse direction to those to the left of said center line.

Method for making soft magnetic film

Growing community of inventors

Osaka, Japan

Toshiyuki Suemitsu