Tokyo Ohka Kogyo Co., Ltd.

Nanomembrane Technologies, Inc.

Chugai Seiyaku Kabushiki Kaisha

Riken Corporation

Central Japan Railway Company

Nara Institute of Science and Technology

Dengensha Toa Co., Ltd.

Toshiyuki Ogata

Hideo Hada

Masaaki Yoshida

Kotaro Endo

Shogo Matsumaru

Syogo Matsumaru

Daiju Shiono

Taku Hirayama

Shigenori Fujikawa

Takuya Noguchi

Hiromitsu Tsuji

Mitsuru Sato

Hiroshi Komano

Takahiro Senzaki

Yasuo Suzuki

Toyoki Kunitake

Takashi Ohsaka

Hirofumi Imai

Yohei Kinoshita

Motoki Takahashi

Atsushi Murota

Takahiro Asai

Takeshi Iwai

Hiroaki Shimizu

Koichi Misumi

Kazufumi Sato

Yoshihiro Arai

Kazuyuki Nitta

Hiroyuki Tsunoda

Kiyoshi Ishikawa

Koki Tamura

Naotaka Kubota

Takahiro Yoshioka

Atsushi Kubo

Ryoji Watanabe

Toshikazu Takayama

Ryoichi Takasu

Takeshi Baba

Tetsuya Shichi

Akimasa Nakamura

Yoshiaki Iwamoto

Christopher Cordonier

Noriyuki Takahashi

Teruhiro Uematsu

Koutaro Endo

Takayuki Hosono

Waki Okubo

Selyanchyn Roman

Miho Ariyoshi

Masanobu Naito

Yusuke Nakamura

A bolt feeder includes: a rotating plate () arranged adjacent to a hopper () storing bolts (); one or more magnets () to attract the bolts (), from a back surface of the rotating plate (), onto a front surface of the rotating plate (); a selection block () having a gap space () through which one bolt in a predetermined orientation out of the bolts () attracted by the one or more magnets () is allowed to pass; a motor () to cause the one or more magnets () to rotate and move from the hopper () toward the selection block (); and a guide plate () extending upstream in a moving direction of the one or more magnets () from an entrance of the gap space (), and guiding the bolts () attracted by the one or more magnets () to the gap space ().

Bolt feeder

A filter film includes a through-hole and a recessed portion having a size capable of capturing one particle, in which the recessed portion is open to one face of the filter film, the through-hole in the one face has a shape or a size such that the one particle is not capable of passing through the through-hole, and the through-hole and the recessed portion are disposed close to each other.

Filter film and use thereof

The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 &#x3bc;m or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.

Gas separation method and gas separation membrane

A particle capture device includes first and second substrates. The first substrate has recessed portions that have a size capable of capturing one particle. Each recessed portion has connection holes that have a size capable of allowing a dispersion medium of particles to move therethrough. A flow path that has the connection holes as an inlet port and an end portion of a first side of the first substrate as an outlet port is defined between the first substrate and the second substrate. A total opening area of the connection holes is 1 mmor more and less than 10 mm, and a cross-sectional area of the flow path at the outlet port is 0.8 times or more the total opening area; or the total opening area is 10 mmor more and 1000 mmor less, and the cross-sectional area is 0.1 times or more the total opening area.

Particle capture device

In an aspect, the present invention provides a structure, a structure-manufacturing method, a cell-sorting method, or the like. In an aspect, a structure () of the present invention is a structure including a first substrate () and a second substrate () disposed to face one side of the first substrate (), in which the first substrate () has a plurality of depressions () which are open to the other side of the first substrate and each of which has a size that enables each of the depressions to capture one unit of a cell, at least some of the depressions () have communication holes () which communicate with one side and the other side of the first substrate and each of which has a size that enables secretions secreted from the cell to move through the communication holes, the second substrate () can include accumulation portions () in which the secretions moving through the communication holes () are accumulated, and the accumulation portions () can correspond to the depressions ().

Substrate, structure, structure-manufacturing method, cell-sorting method, cell-manufacturing method, and secretion-producing method

An adhesive composition contains (a) a resin consisting of (i) a block copolymer or (ii) 35% by weight or greater and less than 100% of the block copolymer and 65% by weight or less of a random copolymer, the block copolymer having a weight average molecular weight in a range of 50,000 to 150,000, wherein the block copolymer is a diblock copolymer, a triblock copolymer, or a combination thereof, and includes a styrene group, both terminals of a main chain of the triblock copolymer are styrene groups; (b) a solvent which includes a condensed polycyclic hydrocarbon, wherein an adhesive layer formed by using the adhesive composition has a Young's modulus of 0.1 GPa or greater at 23&#xb0; C., a storage modulus (G') of 1.5&#xd7;10Pa or less at 220&#xb0; C., and a loss factor (tan &#x3c3;) of 1.3 or less at 220&#xb0; C.; and (c) a thermal polymerization inhibitor.

Adhesive composition, adhesive film, and bonding method

The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein Rand Reach independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M, Mand Meach independently represents a metal atom, m1 represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand), a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane. 

Gas-permeable membrane

After bringing a water-containing peeling liquid in contact with a thin flat film formed on a substrate, a support film including a cover film having one main surface thereof is laminated onto the flat film, such that the support film is in contact with the flat film, a cover film-attached laminate composed of a support film and a cover film is then separated from the substrate, and the laminate including the flat film and the support film is separated from the cover film-attached film.

Method for manufacturing laminate, and laminate

A substrate having rod-like molecules on a surface thereof including: a substrate in which a pattern including a convex portion with a flat upper surface is formed on at least a portion thereof; and a plurality of rod-like molecules, which are formed into rod-like shape, are aligned in line in a direction crossing a molecular length direction of each of the rod-like molecules an the upper surface of the convex portion, and have liquid crystalline states, wherein the molecular length Lof the rod-like molecule is 2.0 or less times L, which is a length of the rod-like molecule in the molecular length direction within the convex portion; and a method for producing a substrate having rod-like molecules on a surface thereof.

Substrate having rod-like molecules on surface thereof and method for producing the same

An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140&#xb0; C. to 200&#xb0; C., as well as high heat resistance and favorable crack resistance.

Adhesive composition, film adhesive, and method for producing the adhesive composition

A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below:[Formula 1]&#x2014;CH&#x2014;O-AO&#x2014;CH&#x2014;]&#x2003;&#x2003;(1)(wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).

Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern

Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

Positive-type photosensitive composition

A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support.

Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material

A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.

Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern

A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.

Method of forming a nano-structure and the nano-structure

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Kawasaki, Japan

Toshiyuki Ogata