Sumitomo Electric Industries, Limited

Toshiyuki Numazawa

Yasuhiro Tanaka

Yoshihiro Hirata

Kazuo Nakamae

Tsuyoshi Haga

Jun Yorita

Kazunori Okada

Seiji Ogino

Yoshikazu Tanji

Satoshi Kondou

A method of manufacturing a contact probe includes an electroforming step of, using a resist film () arranged on a substrate () as a pattern frame having a shape corresponding to a contact probe, performing electroforming to fill a gap in the resist film () to form a metal layer (), a tip end shaping step of obliquely removing and sharpening that part of the metal layer () which serves as a tip end portion of the contact probe, and a take-out step of taking out only the metal layer () from the pattern frame.

Contact probe, method of manufacturing the contact probe, and device and method for inspection

A method of forming a microstructure having a higher aspect ratio by using a general purpose synchrotron orbital radiation apparatus is provided. A resist layer mainly including a copolymer of methylmethacrylate and methacrylic acid is formed relatively thick on a substrate. Lithography by synchrotron orbital radiation is carried out on the resist layer, to form a resist pattern. By carrying out normal electroplating, electro-forming or the like in accordance with the resist pattern, a microstructure having a high aspect ratio is obtained.

Method of forming a micro structure and an x-ray mask

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Hyogo, Japan

Toshiyuki Numazawa