L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

Toshiyuki Nakagawa

Kazutaka Yanagita

Naoyuki Nakamoto

Tetsuro Shigeno

Masaaki Muro

Kazuma Suzuki

Shingo Okubo

Kohei Tarutani

Terumasa Koura

Takashi Kameoka

Yoichi Sakata

Ikuo Suzuki

Masahiro Kimoto

Yoshio Uetake

Takamitsu Shigemoto

Kouki Morimoto

Yuki Kumamoto

Mikio Goto

Koji Ishida

Koji Matsumoto

Supply system include a first vessel containing the precursor, a second vessel, a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a flow control device are fluidically mounted therein, a second gas conduit fluidically connecting the second vessel to a point of use, and a pressure gauge downstream the pressure reduction device for measuring a partial pressure of the precursor in the second vessel, wherein the partial pressure of the precursor in the second vessel is at a pressure lower than the saturated vapor pressure of the precursor at the temperature of the second vessel and higher than an inlet pressure requirement of the flow control device at the point of use. Methods for using the supply system are also disclosed.

Supply system for low volatility precursors

The present invention provides a supply system enabling a precursor of a solid material or a precursor of a liquid material to be supplied to a latter process at no higher concentration than required and also at or above a predetermined concentration. A supply systemcomprises: a vesselfor receiving a precursor material; a vessel heating unit for heating the vessel at a set temperature; a carrier gas heating unit which is disposed in an introduction line Land heats a carrier gas; a main measurement unit which is disposed in an outward conduction line Land obtains data relating to a gas of the precursor; and a carrier gas temperature control unit for controlling the temperature of the carrier gas heating unit in accordance with a measurement result of the main measurement unit.

Precursor supply system and precursors supply method

Disclosed are methods and apparatuses for supplying a liquid and controlling its level inside of a container. In particular, the liquid inside of the container may be a liquid material suitable for use in a chemical vapor deposition process, wherein the liquid is controlled and supplied in a manner which minimizes the introduction of impurities.

Device for supplying the liquid material inside a filling container and method of controlling the liquid level inside the filling container for said liquid material supply device

The present invention is aimed at providing a method for simply measuring the liquid quantity of liquid material in a receptacle. A liquid quantity measuring apparatus for use in a liquid material supplying system comprising a receptacle for storing liquid material, a first pipe for feeding feeder gas into said receptacle, a first shutoff valve provided in said first pipe, a second shutoff valve provided in said first pipe downstream of said first shutoff valve and a second pipe for supplying the liquid material from said receptacle to supplier's destinations, and for measuring the liquid quantity of the liquid material in said receptacle, the measuring apparatus comprising: &#x2014;a first pressure detection means for detecting the pressure of feeder gas in said pipe between said first shutoff valve and said second shutoff valve; &#x2014;a second pressure detection means for detecting the pressure of gas in said receptacle; and &#x2014;an arithmetic processing means for seeking by arithmetic calculation the liquid quantity of the liquid material in said receptacle on the basis of the detection results of said first pressure detection means and said second pressure detection means.

Liquid quantity measuring apparatus, liquid quantity measuring method and method for supplying quantitively supplying liquid material

Embodiments of the invention generally provide apparatus and methods for vaporizing liquid precursors. In one embodiment, a bubbling system for supplying a vapor of liquid precursor is provided including a gas flow conduit having a first end and a second end, a nozzle structure connected to the second end of the gas flow conduit, and comprising one or more perforated conduits fluidly coupled with the second end of the gas flow conduit, and a plate disposed around the gas flow conduit and in a spaced relationship from the nozzle structure, wherein both the one or more perforated conduits and the plate extend radially from an axis of the gas flow conduit.

Bubbling supply system for stable precursor supply

Growing community of inventors

Kobe, Japan

Toshiyuki Nakagawa