Canon Kabushiki Kaisha

Toshiyuki Komatsu

Katsumi Nakagawa

Yutaka Hirai

Tadaji Fukuda

Masaki Fukaya

Teruo Misumi

Yasue Sato

Tatsumi Shoji

Yoshiyuki Osada

Nobuyuki Sekimura

Katsunori Hatanaka

Takashi Nakagiri

Masaru Kamio

Satoshi Omata

Shin-Ichi Kawate

Takayuki Yagi

Shinichi Kawate

Isamu Shimizu

Eiichi Inoue

Motoharu Fujii

Shinichi Seito

Keisuke Yamamoto

Shunichi Uzawa

Noboru Koumura

Yoshiaki Shirato

Hirofumi Iwamoto

Nobuhiro Takekawa

Takeshi Imamura

Yoshio Takasu

Shinya Kozaki

Ihachiro Gofuku

Satoshi Itabashi

Masanori Sakuranaga

Ichiro Endo

Seishiro Yoshioka

Yasuo Kuroda

Shinichi Seitoh

Shigeru Ohno

Soichiro Kawakami

Toshihiko Miyazaki

Kinya Kato

Susumu Sugiura

Tsuyoshi Nomoto

Tatsundo Kawai

Noritaka Mochizuki

Kazumi Tanaka

Mitsutoshi Kuno

Yuji Kawabata

Hajime Kobayashi

Yukitoshi Okubo

Masashi Kiuchi

Teruhiko Furushima

Toshio Watanabe

Isamu Maki

Mitsuo Sato

Saburo Shoji

Tatsuyoshi Kanai

A processing method for etching a substrate is described. This method includes subjecting a surface of a substrate to be processed to selective irradiation with a light in a gas atmosphere to form a surface-modified layer. The substrate surface with the surface-modified layer is then annealed to stabilize and make the surface-modified layer more etch resistant. Both the stabilized surface-modified layer and a non-modified portion of the substrate are then subjected to dry etching, thereby utilizing the higher resistance to dry etching of the stabilized surface-modified layer compared to the non-modified portion to selectively etch the non-modified portion to a desired depth.

Processing method for etching a substrate

There are here provided a method for biodegrading trichloroethylene which comprises the step of bringing an aqueous medium containing trichloroethylene into contact with microorganisms having a trichloroethylene degrading ability derived from intestines of termites to degrade trichloroethylene; a method for obtaining the microorganisms; a method for remediating a soil by the use of the microorganisms; and a method for biodegrading an chlorinated organic compound with the microorganisms.

Method for biodegrading trichloroethylene and method for biodegrading

Processing method for selectively irradiating a surface in presence of a

Processing method and apparatus

An apparatus for degrading a pollutant to purify a medium containing a pollutant using a microorganism, which comprises a container in which a region containing a microorganism capable of degrading the pollutant is provided, wherein the container has the first opening for introducing the medium into the container and the second opening for draining the medium passed through the region containing the microorganism from the container, and in the container a region containing a functional material which releases a material required for degrading the pollutant by the microorganism is provided between the first opening and the region containing microorganism.

Apparatus for degrading pollutant, process for purifying contaminated

A carrier for holding a microorganism in soil releases, from a constituting material thereof, an inducer for production of an enzyme of the microorganism for soil remediation. The carrier for holding a microorganism may comprise a combination of a microorganism holding carrier composed of a hydrophilic polymer for holding the microorganism with an inducer-holder composed of another polymer for holding inducer manifesting a biological action to the microorganism adjacent to each other. A method for remediation of soil comprises application of the microorganism-holding carrier into the soil. A soil-remedying agent comprises the microorganism-holding carrier and a microorganism held thereon which exhibits enzyme activity for decomposition of a polluting substance in the soil under action an inducer released by the carrier.

Microorganism-holding carrier and method for remediation of soil

A processing method is described which has a first step of depositing on a substrate a specimen film which may be any one of a semiconductor, a metal and a insulator. In a second step, the surface of the specimen film deposited in the first step, is irradiated with an ion beam to produce a physical damage on the surface, next, in a third step, the damaged specimen film surface is selectively irradiated with the light to partially cause a photochemical reaction so that a mask pattern, which depends on the desired device structure, is formed on the film surface. Finally, in a fourth step, photoetching is performed using the mask pattern formed in the third step as a shielding member.

Processing method for patterning a film

An electrophotographic apparatus employs a charger for charging a cylindrical photosensitive member having a photoconductive layer of amorphous silicon containing 10 to 40 atomic % hydrogen; an exposing station for imagewise exposing the member to form an electrostatic latent image; a developer station for developing the latent image to form a toner image; a transfer station for transferring the toner image to an image receiving sheet and a blade for cleaning the surface of the cylindrical member.

Electrophotographic method using a cleaning blade to remove residual

An image-forming member for electro-photography has a photoconductive layer comprising a hydrogenated amorphous semiconductor composed of silicon and/or germanium as a matrix and at least one chemical modifier such as carbon, nitrogen and oxygen contained in the matrix.

Image forming member for electrophotography

A hydrogen storing member which comprises at least two kinds of hydrogen storing materials comprising a first hydrogen storing material and a second hydrogen storing material capable of releasing or storing hydrogen in a range of at least one of temperature and pressure at which the first hydrogen storing material is in the .beta. phase having a high capacity for storing hydrogen.

Hydrogen storing member and process for storing hydrogen into the

A layer of amorphous silicon containing H, preferably 10-40 atomic % H, is used as a photoconductive layer for electrophotographic photosensitive member.

Electrophotographic photosensitive member and process for production

An electrophotographic process is conducted by charging a cylindrical photosensitive member having a photoconductive layer of amorphous silicon containing 10 to 40 atomic % hydrogen; imagewise exposing the member to form an electrostatic latent image; developing the latent image to form a toner image; transferring the toner image to an image receiving sheet and thereafter cleaning the surface of the cylindrical member with a cleaning blade.

A layer of amorphous silicon containing H, preferably 10-40 atomic % H, which is used as a photoconductive layer for electrophotographic photosensitive member, is formed by plasma CVD using a silane gas of a higher than monosilane.

CVD method for forming a photoconductive hydrogenated a-Si layer

Growing community of inventors

Hiratsuka, Japan

Toshiyuki Komatsu