Tosoh Corporation

Kyushu University

Toshiya Takahara

Akio Kondo

Osamu Matsunaga

Wataru Kobayashi

Shigeto Okada

Kentaro Utsumi

Masaki Okada

Shinji Tokitaka

Baowei Xie

Masato Ito

Ryo Sakamoto

To provide an aqueous sodium ion secondary battery which can achieve a high electrochemical capacity as compared with a known sodium ion secondary battery having an aqueous electrolytic solution. An aqueous sodium ion secondary battery includes a cathode, an anode, an electrolytic solution and a separator, wherein the cathode has at least a cathode active material containing at least a sodium transition metal polyanion represented by the formula NaMPOCO(M is at least one member selected from the group consisting of Fe, Mn, Ni and Co, and x is 0 or more and 2 or less), and the electrolytic solution is an aqueous electrolytic solution.

Aqueous sodium ion secondary battery

A sintered ITO compact is provided which is capable of retarding nodule formation, or particle generation. The sintered ITO compact is composed of In, Sn, and O, and has avelage length of void size of not larger than 0.7 .mu.m. This sintered ITO compact is produced by sintering, substantially in an oxygen atmosphere, a green compact formed from a mixed powder of indium oxide power and tin oxide powder, the mixed powder containing the tin oxide powder at a content ranging from 5% to 15%, and the tin oxide powder having particles of a particle size of not more than 1 .mu.m constituting not less than 90% portion thereof; or produced by sintering, in an oxygen atmosphere, a green compact formed from a mixed powder of indium oxide powder and tin oxide powder, the mixed powder having a tap density of not less than 1.8 g/cm.sup.3, and the tin oxide powder having a maximum particle size of not larger than 1 .mu.m and a median diameter of not larger than 0.4 .mu.m.

Process of preparing high-density sintered ITO compact and sputtering

A method for producing cement is disclosed. The method has the advantages that a setting time can be shortened as compared with conventional cement, and a manganese slag can be treated at low cost without giving load to environment, by using the manganese slag which has conventionally been subjected to waste disposal, as a cement raw material. The method comprises using, as a part of cement materials, a manganese slag which is an insoluble component formed in extraction step and refining step in a production of electrolytic manganese dioxide comprising extracting a manganese component from manganese-containing ore, refining a manganese-containing aqueous solution obtained, and conducting electrolytic treatment, to produce manganese dioxide.

Method for producing cement using manganese slag as raw material

An ITO sputtering target comprised of indium oxide and tin oxide and having a density of at least 6.4 g/cm.sup.3, wherein the center line average height (R.sub.a) of the surface to be sputtered is not larger than 0.8 .mu.m, and at least one property selected from the following (i), (ii) and (iii) is satisfied: (i) the maximum height (R.sub.max) is not larger than 7.0 .mu.m, (ii) the ten point average height (R.sub.z) is not larger than 6.0 .mu.m, and (iii) the maximum height (R.sub.t) of said surface as expressed by the distance between two lines which are parallel to the center line of a surface roughness curve drawn as measured at a sample length of 2.5 mm, and which sandwich said surface roughness curve, is not larger than 6.5 .mu.m. Preferably, R.sub.a and the or each property (R.sub.max, R.sub.z or R.sub.t) selected from (i), (ii) and (iii) satisfy the formula: R.sub.a .times.(R.sub.max, R.sub.z or R.sub.t).ltoreq.3.0 .mu.m.sup.2.

ITO sputtering target

Growing community of inventors

Kanagawa, Japan

Toshiya Takahara