Agc Inc.

Agc Si-Tech Co., Ltd.

Toshiya Matsubara

Hyunji Kim

Hiroyuki Kamiya

Yusuke Arai

Hajime Katayama

The present invention related to a hollow silica particle including: a shell layer containing silica; and a space formed inside the shell layer, in which the hollow silica particle has a particle density as measured by a dry pycnometer density measurement using helium gas of 2.00 g/cmor more and a particle density as measured by a dry pycnometer density measurement using oxygen gas of lower than 2.00 g/cm.

Hollow silica particles and method for manufacturing hollow silica particles

To provide hollow silica particles having a dense silica shell layer. A method for producing hollow silica particles, which comprises:

Method for producing hollow silica particles

To provide hollow silica particles having a dense silica shell layer. A method for producing hollow silica particles, which comprises: adjusting the pH of an oil-in-water emulsion containing an aqueous phase, an oil phase and a surfactant to at most 3.0 and adding a first silica material to the oil-in-water emulsion, adding a second silica material to the emulsion having the first silica material added, at its pH of at least 8, in the presence of alkali metal ions, to obtain a hollow silica precursor dispersion, and obtaining a hollow silica precursor from the hollow silica precursor dispersion and obtaining hollow silica particles from the hollow silica precursor.

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Chiyoda-ku, Japan

Toshiya Matsubara