Asahi Kogaku Kogyo K.k.

Asahi Kogaku Kogyo Kabushiki Kaisha

Toshitaka Yoshimura

Takashi Okuyama

Akira Morimoto

Satoru Tachihara

Yuji Matsui

Yasushi Ikeda

Masatoshi Iwama

Hideyuki Morita

Tamihiro Miyoshi

Hidetaka Yamaguchi

Akira Ohwaki

Michio Ohshima

Mitsuo Kakimoto

Jun Nonaka

Hiroaki Andoh

Jun Nonoka

Hiroaki Andon

A plotter system has a data converting portion for converting image data to raster data. An intermediate memory temporarily stores the converted data, while a plot portion draws an image based upon the data outputted from the intermediate memory.

Plotter with drawing speed change

A scanning pattern drawing apparatus which scans the surface of a workpiece with a light beam so that a pattern is described on the workpiece with the issued light beam being controlled on the basis of pattern drawing data stored in a pattern memory, wherein the pattern drawing apparatus is able to read many pieces of data in a short period of time even if the frequency of the timing pulses is reduced and which therefore is capable of drawing a precise pattern on a workpiece. A scanning pulse generator produces as scanning pulse in response to a predetermined amount of scanning with the light beam. The scanning pulse is converted to a plurality of resulting timing pulses, and successive parallel outputs of the timing pulses are produced after delaying by a predetermined time. The pattern drawing data is read from the pattern memory in response to the delayed timing pulses.

Scanning pattern drawing apparatus

A drawing surface adjusting mechanism suitable for use with a large scanning pattern drawing apparatus in which a scanning optical system scans drawing rays of light along scanning lines on a workpiece on a drawing board. A plurality of light-emitting units project rays of light in a wavelength region outside a sensitivity range of the workpiece onto a drawing surface of the workpiece in such a way that the rays substantially converge at more than one point along a scanning line of the drawing rays of light, preferably at center and end points along the scanning line. A plurality of condenser lenses are provided for focusing beams of light from the plural light-emitting units after the beams have been reflected by the drawing surface. A plurality of light-detecting elements are disposed at points of condensation by respective ones of the condenser lenses to produce output signals representing differences in condensation points that occur as the lenses depart from or approach the drawing surface. A drive unit effects relative displacement between the scanning optical system and the drawing board in response to the outputs from the light-detecting elements.

Drawing surface adjusting mechanism for scanning pattern drawing

An apparatus for correcting a scranning beam produced by a polygonal mirror tilting in small surface segments in each mirror surface segment caused by uneven mirror surfaces of the polygonal mirror. Data indicative of the amount of tilting in each of the surface segments is stored in a memory, which is addressed by a data signal indicative of the present scanning position of the polygonal mirror. Output data from the memory is applied to an acousto-optical modulator disposed in the beam path between the light source and the polygonal mirror.

Apparatus for correcting scanning beams on basis of tilting of surface

A monitor mechanism for use with a scanning optical apparatus in which the direction of polarization is utilized to separate a source laser light beam into a pattern drawing and a monitor beamlet and to synthesize them again into a single after passing through a scanning lens and beam deflector. The two beamlets can thus be controlled so as to project towards the deflector and scanning lens in the same direction, which is effective in reducing the offset between the pattern drawing and monitor beams that may occur on account of such factors as variations in lens performance.

Monitor mechanism for use with a scanning optical apparatus with

A drawing surface adjusting mechanism for use with a scanning pattern drawing apparatus capable of not only moving a drawing board in a vertical direction but also tilting it, whereby the chance of bringing the drawing surface within the depth of focus of a scanning lens is increased even if the drawing surface has waviness or other flaws within the width of a single storke of scanning. The drawing surface adjusting mechanism of the invention includes a drawing board for supporting a workpiece that is to be scanned with a scanning optical system by means of a unidirectionally tracing light beam, transport means for allowing the drawing board and the scanning optical system to slide relative to each other in a direction that crosses the direction of beam tracing at right angles, a first and a second drive mechanism which are spaced apart in the tracing direction and which move one side of the drawing board in a direction parallel to the direction of the beam, tilt control means for inclining the drawing board with respect to the transport means by making the drive amount of the first drive means different from that of the second drive means, and translation control means for effecting a translational movement of the drawing board with respect to the transport means by making the drive amount of the first drive means equal to that of the second drive means.

Drawing surface adjusting mechanism for use with scanning pattern

A table assembly that is simple in construction and which yet resists yawing in an effective way and is adapted for use with a scanning pattern drawing apparatus which involves continuous movements of the table. The inventive table assembly includes a master table that is slidable in one direction with respect to a fixed portion of the overall assembly and to which a drive force for causing the table to slide in the one direction is transmitted directly, and a working table that is slidable in the one direction with respect to the fixed portion and which is linked to the master table by connecting means having rigidity in the one direction and elasticity in a direction perpendicular to the one direction.

Growing community of inventors

Tokyo, Japan

Toshitaka Yoshimura