Canon Kabushiki Kaisha

Toshitaka Amano

Osamu Morimoto

An exposure apparatus includes a projection optical system, an original stage having a first reference mark, a substrate stage, and a measurement instrument configured to measure first image properties of a mark formed on the original with the projection optical system, via the original and the projection optical system. The measurement instrument is also configured to measure the properties of a second image with the projection optical system of the first reference mark, via the reference mark and the projection optical system. The exposure apparatus also includes a calculating unit for calculating a first heat change coefficient due to the projection optical system and a second heat change coefficient due to the original, with relation to the properties of images formed by the projection optical system.

Exposure apparatus and device manufacturing method

An exposure apparatus for projecting a pattern on a reticle onto a substrate via projection optics to expose the substrate to the pattern. The apparatus includes a focus detection system for detecting focus of the projection optics, a barometer for measuring at least one of atmospheric pressure and ambient air pressure within the apparatus, a calibration device for calibrating the focus detection system, and a correction device. The correction device acquires a correction quantity, for correcting for a change in an image-formation characteristic ascribable to a fluctuation in air pressure of the projection optics, based upon a result of a measurement performed by the barometer during execution of the calibration, and corrects operation of the calibration device using the correction quantity.

Exposure apparatus and pressure correction method

An exposure apparatus or a device manufacturing method, wherein a focus measuring device measures a best focus position upon projecting and exposing, through a projection optical system, a pattern of an original plate onto a substrate placed on a movable stage, by obtaining predetermined estimating information indicative of a blur degree of an image being observed, when observing a reference mark on the movable stage or the surface of the substrate by the focus measuring device, while changing a relative position between the movable stage and the projection optical system toward an optical axis direction of the projection optical system. This exposure apparatus or device manufacturing method controls whether or not the best focus position is measured, based on (i) an elapsed time after a last projection and exposure or (ii) the estimating information obtained at a predetermined time by the focus measuring device and estimating information obtained at the time of measuring the best focus position at the preceding time.

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Kawachi-gun, Japan

Toshitaka Amano