Tomoegawa Paper Co., Inc.

Other

Toshio Tagami

Osamu Kiyohara

Mitsukazu Ochi

Yukinori Sakumoto

Takeshi Hashimoto

Yoshio Imai

Haruo Okutani

Hitoshi Narushima

Kazue Nakadera

Hideki Kurebayashi

Masaaki Kakimoto

A graft resin having a structure of the formula (1) and having a number average molecular weight of 2,000 to 50,000,

Graft resin, process for the production thereof and use thereof

Bisimide compound and process for the production thereof

A toner for developing an electrostatic image, which is composed of a binder resin and a colorant as main components, said binder resin containing a phenolic hydroxyl group-containing polyester resin as a main component, which toner is energy-saving, suitable for use in a contact heat fixing method using a hot roller, has a high fixing strength at a low temperature and excellent offset preventing properties and is excellent in fixing strength and offset preventing properties in a broad fixing temperature range.

Toner for developing electrostatic image

Polyamide-hydrogenated polybutadiene-acrylonitrile block copolymers having high solubility in organic solvents, good compatibility with other polymers, and excellent thermal resistance and adhesive properties are characterized by comprising block units (A) represented by the following formula (I) and block units (B) represented by the following formula (III): ##STR1## wherein Bu is hydrogenated butadiene radical, R is divalent organic radical, R' is a divalent aromatic group having a hydroxyl group, Ar is an aromatic divalent group represented by the following formulae (1)-(6): ##STR2## each of k and z is an average polymerization degree where k is an integer of 2-400, and z is an integer of 5-100, m and n are molar fractions in the copolycondensation, where m.gtoreq.0.04, and m+n=1, and x and y are molar fractions in the copolymerization, where x:y=0.95:0.05 to 0.6:0.4, and x+y=1, and block units (A) and (B) are contained in the range of 2 to 20, respectively.

Polyamide-hydrogenated polybutadiene-acrylonitrile copolymers

Disclosed is a polyamide/polybutadiene/acrylonitrile block copolymer useful in a wide variety of applications, such as an adhesive film, which comprises a polycondensate comprising a polybutadiene/acrylonitrile copolymer having a carboxyl group at each terminal thereof and a polyamide having an aminoaryl group at each terminal, and which is represented by general formula (I) ##STR1## wherein R is a divalent organic group, Ar is a divalent aromatic group, x, y, z, m and n each: represent mean degree of polymerization and are integers in the ranges of x=3 to 7, y=1 to 4, z=5 to 15, n=1 to 30, and nm=2 to 20, respectively. Also, disclosed is a method of producing the polyamide/polybutadiene based block copolymer by polycondensing an aromatic diamine with an aromatic dicarboxylic acid to form a polyamide having an aminoaryl group at each terminal thereof, and then polycondensing it with a poiybutadiene/acrylonitrile copolymer having a carboxyl group at each terminal thereof, preferably in the presence of an aromatic phosphite and a pyridine derivative.

Block copolymer and method of producing the same

An epoxy resin modified material is disclosed, which is obtained by reacting an epoxy resin and a phenolic hydroxyl group-containing aramid/polybutadiene-acrylonitrile block copolymer represented by formula (I): ##STR1## wherein Ar.sup.1 and Ar.sup.3 each represent a divalent aromatic group; Ar.sup.2 represents a phenolic hydroxyl group-containing divalent aromatic group; x represents an integer of from 3 to 7; y represents an integer of from 1 to 4; y/(x+y) is from 0.1 to 0.3; z represents an integer of from 5 to 15; m represents an integer of from 1 to 400; n represents an integer of from 1 to 400; n/(m+n) is from 0.01 to 0.50; and l represents an integer of from 1 to 50. An epoxy resin composition containing the epoxy resin modified material is useful as a cationic electrodeposition coating.

Epoxy resin reacted with phenolic OH-aramide/ban

An epoxy resin modified material is disclosed, which is obtained by reacting an epoxy resin and a phenolic hydroxyl group-containing aramid/polybutadiene-acrylonitrile block copolymer represented by formula (I): ##STR1## wherein Ar.sup.1 and Ar.sup.3 each represent a divalent aromatic group; Ar.sup.2 represents a phenolic hydroxyl group-containing divalent aromatic group; x represents an integer of from 3 to 7; y represents an integer of from 1 to 4; y/(x+y) is from 0.1 to 0.3; z represents an integer of from 5 to 15; m represents an integer of from 1 to 400; n represents an integer of from 1 to n/(m+n) is from 0.01 to 0.50; and l represents an integer of from 1 to 50. An epoxy resin composition containing the epoxy resin modified material and a carboxyl-terminated polybutadiene-acrylonitrile copolymer is useful as a cationic electrodeposition coating.

Epoxy resin/phenolic OH-aramid/ban block copolymer product with CTBN

An epoxy resin modified material is disclosed, which is obtained by reacting an epoxy resin and a phenolic hydroxyl group-containing aramid/polybutadiene-acrylonitrile block copolymer represented by formula (I): ##STR1## wherein Ar.sup.1 and Ar.sup.3 each represent a divalent aromatic group; Ar.sup.2 represents a phenolic hydroxyl group-containing divalent aromatic group; x represents an integer of from 3 to 7; y represents an integer of from 1 to 4; y/(x+y) is from 0.1 to 0.3; z represents an integer of from 5 to 15; m represents an integer of from 1 to 400; n represents an integer of from 1 to 400; n/(m+n) is from 0.01 to 0.50; and l represents an integer of from 1 to 50. An epoxy resin composition containing the epoxy resin modified material is also disclosed.

Growing community of inventors

Shizuoka, Japan

Toshio Tagami