Hitachi, Ltd.

Other

Hitachi Cable, Inc.

Sumitomo Bakelite Company Limited

Research Development Corporation of Japan

Hitachi Automotive Engineering Co., Ltd.

Hitachi Computer Peripherals Co., Ltd.

Toshio Suzuki

Masamichi Ishihara

Hidetoshi Iwai

Toshitsugu Takekuma

Kiyoji Morita

Hiroyuki Yamada

Ryoso Masaki

Mitsuo Usami

Shigeki Morinaga

Kazuo Tahara

Masaaki Matsumoto

Nobuyoshi Mutoh

Hiroshi Sakurai

Seizo Miyata

Yokuo Saitoh

Keijiro Sakai

Hirohisa Yamamura

Takeshi Hosomi

Hiroshi Daito

Yasuo Kojima

Akiteru Ueda

Kenji Nandoh

Mikio Takahashi

Toshiyuki Watanabe

Tetsuo Masukawa

Shigeo Hara

Yukimori Umakoshi

Kenzo Kajiwara

Eiji Nakanishi

Ikuo Okajima

Akio Mitsuoka

Yoshiyuki Tetsu

Akio Hayashi

Hironobu Yamamoto

Nobuo Inoue

Setsuo Sekine

Minoru Taguchi

Masato Furusaki

In a method of designing/manufacturing a plurality of semiconductor integrated circuit devices having built-in ROMs each storing different data on a single wafer, a ROM pattern is formed in combination with a pattern that is common to a plurality of semiconductor integrated circuit devices other than the ROM pattern.

Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device

Pattern data of a phase shift mask can be inspected: (101) by separating and laying out pattern data of a phase shift mask in an actual pattern data layer, an auxiliary pattern data layer and a phase shift pattern data layer; (102) by inspecting and correcting only the data of the actual pattern of the actual pattern data layer; (103) by making data of an estimated pattern estimated to be transferred to a semiconductor wafer from the data of the synthetic data of the correct actual pattern data, the auxiliary pattern data and the phase shift pattern data, which are inspected and corrected; and (104) by comparing the estimated pattern data and the actual pattern data to inspect the data of the auxiliary pattern and the phase shift pattern.

Method of making mask pattern data and process for manufacturing the mask

Controller for electric vehicle

Pattern data of a phase shift mask can be inspected: (101) by separating and laying out pattern data of a phase shift mask in an actual pattern data layer, an auxiliary pattern data layer and a phase shift pattern data layer; (102) by inspecting and correcting only the data of the actual pattern of the actual pattern data layer; (108) by making data of an estimated pattern estimated to be transferred to a semiconductor wafer from the data of the synthetic data of the correct actual pattern data, the auxiliary pattern data and the phase shift pattern data, which are inspected and corrected; and (104) by comparing the estimated pattern data and the actual pattern data to inspect the data of the auxiliary pattern and the phase shift pattern.

A magnetic head includes a gimbal with a head slider attached thereon, a load beam retained on the gimbal, and a mount attached on an end portion of the load beam on a side opposite to a side where the head slider is attached. A fulcrum portion as a center of load of the head slider is set on the gimbal to be shifted from a center of the head slider along its longitudinal direction to a proximal end side of the load beam, namely, toward an air upstream side. To compensate for the imbalance of the floating force due to the shift of the fulcrum portion, there is generated a moment about the fulcrum portion. The moment is provided by assigning an inclination angle to a slider attaching surface of the gimbal. The inclination angle can be adjusted by the height of the projection formed as the fulcrum portion. Moreover, the moment is generated by disposing rails on the head slider such that the width on the air upstream side of each rail is wider than the width on the air downstream side of the rail. This compensates for the variation in the load of the head slider and hence minimizes the change in the quantity of floating distance.

Magnetic head supporting apparatus having a fulcrum point of load

A method and apparatus for converting design pattern data for a semiconductor integrated circuit device to an exposure data for use in an exposure apparatus. The pattern data includes a repetition data section corresponding to the repetition section and defining one or more repetitive pattern segments for the unit cells with an overlap between adjacent ones of repetitive pattern segments and a non-repetition data section corresponding to the non-repetition section. Repetition information specifying the repetitive pattern segment is first produced from the design pattern data, and a pattern segment repetition frame is determined on the basis of the repetition information. The pattern segment repetition frame defines a unit region selected from the repetitive pattern segment. A repetitive arrangement of the unit region without any overlap is equivalent to at least a portion of the repetition section. Data for one of the unit cells and those of unit cells which are adjacent the one unit cell are selected and developed on the basis of the repetition information and are pattern-processed to produce processed repetitive pattern segment data and that portion of the processed repetitive pattern segment data which lies within the pattern segment repetition frame is extracted to form a fundamental pattern segment data. The fundamental pattern segment data is repetitively used for drawing the repetition section.

Method of and apparatus for converting design pattern data to exposure

A nonlinear optical material comprising a nitroaniline derivative represented by the following chemical formula:

Nonlinear optical material

A magnetic disk apparatus has a disk assembly including a single servo disk and a plurality of data disks, a servo-head supporting structure for supporting a servo head and data-head supporting structures for supporting data heads. These heads are so disposed as to cooperate with respective disks. The servo-head and data-head supporting structures are driven by an actuator to move the servo head and the data heads to the required positions on the corresponding disks. The servo-head supporting structure and each of the data-head supporting structures have different proper oscillations to prevent the occurrence of a resonance during a seek operation.

Magnetic disk apparatus with head supporting structures of different

A wire with a coated layer for bonding to a joint body by ultrasonic vibration, the coated layer of said wire comprising urethane resin having formulated therein a brominated epoxy resin.

Wire with coating for ultrasonic bonding

A single phase, full wave diode bridge circuit is connected with a chopper on its DC output side. An output voltage of the chopper is smoothed by a smoothing capacitor and thereafter supplied for a load. A current control apparatus forms a current reference signal which is synchronized with an AC voltage applied to the bridge circuit and has a magnitude corresponding to a current flowing through the load and produces a deviation signal between the current reference signal and an actual AC input current of the bridge circuit. The chopper is controlled in accordance with the deviation signal so that the AC input current follows the current reference signal, whereby the power factor and the waveform of the AC input current in the bridge circuit are improved.

Rectifier control apparatus with improved power factor

Growing community of inventors

Hatoyama, Japan

Toshio Suzuki