Canon Kabushiki Kaisha

Toshio Matsuki

Shigeto Kamata

Tadashi Ito

Teruhisa Oda

Yoshihide Kamei

Tatsumi Kobayashi

A linear motor includes a magnet, a coil, and a jacket having an inside member that is comb-shaped having teeth, extending along a driving direction. The coil is engaged by the teeth of the comb-shaped member. A cooling medium flows through an inside space enclosed by the jacket. Unwanted deformation or breakage of the jacket can be avoided even if the pressure of the cooling medium is enlarged or the thickness of a small-thickness portion of the jacket is made smaller. A higher cooling efficiency is thus attainable by increasing the flow rate of the cooling medium.

Linear motor stage system for use in exposure apparatus

A linear motor including a coil and a jacket which covers the coil and allows a cooling medium to be supplied through a space in the jacket. The jacket is made of an insulating material, such as a ceramic material or a high-polymer resinous material. The linear motor can include a reinforcing member in the jacket for strengthening the jacket against the pressure of the cooling medium. Also disclosed are a stage device, an exposure apparatus, and a device producing method using such a linear motor.

Linear motor, and stage device and exposure apparatus provided with the

A projection exposure apparatus includes a projection lens system for projecting a pattern of an original upon a workpiece, an illumination optical system for illuminating the original with a light having a predetermined central wavelength, and a bandwidth changing arrangement effective to change the bandwidth of the light irradiating the original.

Projection exposure apparatus

An exposure apparatus for exposing a wafer to a circuit pattern formed on a reticle. The exposure apparatus includes a reticle stage for holding the reticle, a wafer stage for holding the wafer, a projection optical system for projecting the image of the circuit pattern onto the wafer, an illumination system for illuminating the reticle, the illumination system having a light source for providing an illumination light beam and optical elements for guiding the illumination light beam along an illumination light path, and a stop disposed in the illumination light path and at a position which is optically conjugate, with respect to the optical elements, with a plane in which the circuit pattern is placed, to intercept a part of the illumination light so that the area of the reticle which is not used for the pattern transfer is shielded from the illumination light without disposing any element in contact with or in the proximity of the reticle.

Exposure apparatus

The present invention relates to a plastic molding having satin finish type metallic luster. More particularly, it provides a molding of high accuracy and good appearance. The plastic molding of the present invention is produced by first applying satin finishing to the surface of the molding, providing a conductive coating thereon, applying polishing treatment on the surface of the coating, and forming a metal film thereon by metal plating.

Growing community of inventors

Tokyo, Japan

Toshio Matsuki