Mitsubishi Gas Chemical Company, Inc.

Toshio Kondoh

Tetsuo Aoyama

Hideki Fukuda

Hisaki Abe

Mayumi Takahashi

Masahiro Miyake

Toshihiko Kobayashi

Kaoru Tsuyuki

A flux washing agent which comprises an aqueous solution containing a quaternary ammonium salt and hydrazine is disclosed. The flux washing agent is used in the production of printed circuit boards and the like. The flux washing agent has a washing ability, and a property to suppress etching of solder which are comparable with those of Flon 113 and trichloroethylene heretofore used as flux washing agents. Furthermore, the flux washing agent is safe, does not cause environmental pollution and has an excellent rinsing property.

Flux washing agent

The present invention relates to specific activated carbon materials including from 1 to 5% by weight of nitrogen, from 3 to 30% by weight of oxygen and from 40 to 95% by weight of carbon, and having an average pore radius of from 15 to 30 .ANG., with the proviso that mesopores occupy at least 50% by volume based on the total pore volume, and also relates a process for the preparation thereof, and to the use thereof as catalysts.

Active carbon materials, process for the preparation thereof and the use

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Niigata, Japan

Toshio Kondoh