Arkray, Inc.

Toshinori Fujiwara

Naoyuki Usagawa

Hideki Tanji

The present invention relates to an analyzer () including a photometry mechanism () for photometrically analyzing a reagent pad of an analytical tool to which a sample is applied, and a table () including a placing portion () at which the analytical tool is to be placed. The light emitting surface () or the light incident surface () of the light from the light emitting elements () of the photometry mechanism () is cleaned, with a cleaning tool () placed at the table (). The present invention further provides a cleaning tool () for cleaning the photometry mechanism () of the analyzer ().

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Kyoto, Japan

Toshinori Fujiwara