Mitsubishi Gas Chemical Company, Inc.

Mgc Filsheet Co., Ltd.

Toshinari Aoki

Takeshi Onishi

Kosei Hino

Kazuya Sato

Nobuyuki Koike

Takashi Okawa

Hiroshi Matsunaga

Yoshio Aoki

Osamu Kakinoki

Hidetaka Shimizu

Tatsuya Kanagawa

Hideo Igarashi

Hiroki Oguro

Hirohiko Aikawa

Youji Uehata

Tomohiro Ube

A synthetic resin laminate is excellent in shape stability in high-temperature high-humidity environments and in surface hardness and usable for a transparent substrate material or protection material. A synthetic resin laminate includes a substrate layer containing a polycarbonate (B); and a resin layer laminated on one or both surfaces of the substrate layer, the resin layer containing a resin (A) that contains a (meth)acrylate copolymer (a1) and a polycarbonate (a2); wherein (a1) is a (meth)acrylate copolymer composed of 5 to 80% by mass of an aromatic (meth)acrylate unit (a11) and 20 to 95% by mass of a methyl methacrylate unit (a12); (a2) is a polycarbonate containing a constituent unit represented by formula [1]; and the ratio of (a1) with respect to the resin (A) is 5 to 55% by mass, and the ratio of (a2) with respect to the resin (A) is 95 to 45% by mass.

Synthetic resin laminate

The present invention aims to provide a multi-layer sheet and a multi-layer film, each ensuring not only high transparency but also scratch resistance and being easy to print and thermoform. The above aim was achieved by a multi-layer sheet and a multi-layer film, each being a laminate which comprises a polycarbonate-based resin layer as a substrate and has a thermoplastic acrylic resin layer containing silicon dioxide particles as an outermost layer on one or both surfaces of the substrate, wherein the silicon dioxide particles have an average particle size of 0.1 to 2 &#x3bc;m, and wherein the content of the silicon dioxide particles is 0.1% to 1% by weight, relative to the total weight of the thermoplastic acrylic resin layer.

Scratch-resistant polycarbonate resin laminate

The present invention has an object of providing a synthetic resin laminate that is excellent in shape stability against a high temperature and high humidity environment, surface hardness and the like. The above object is achieved by a synthetic resin laminate, comprising a substrate layer (B) containing polycarbonate; and a resin layer (A) laminated on one or both of two surfaces of the resin layer (B), the resin layer (A) containing 5 to 55% by mass of (meth)acrylate copolymer (C) and 95 to 45% by mass of polycarbonate (D), wherein the (meth)acrylate copolymer (C) contains an aromatic (meth)acrylate unit (c1) and a methyl methacrylate unit (c2) at a mass ratio (c1/c2) of 5-80/20-95, and the (meth)acrylate copolymer (C) has a mass-average molecular weight of 5,000 to 30,000; and the polycarbonate (D) has a mass-average molecular weight of 21,000 to 40,000.

A synthetic resin laminate for use for transparent substrate materials and transparent protective materials is excellent in interlayer adhesiveness, form stability in high-temperature and high humidity environments, surface hardness and impact resistance. The synthetic resin laminate has a vinyl copolymer resin (A) layer and a polycarbonate resin (B) layer, wherein layer (A) is directly laminated on one surface of layer (B), and in which (A) contains a (meth)acrylate structural unit (a) represented by a specific formula and an aliphatic vinyl structural unit (b) represented by a specific formula, the total proportion of the (meth)acrylate structural unit (a) and the aliphatic vinyl structural unit (b) is from 90 to 100 mol % relative to the total of all the structural units in (A), and the proportion of the (meth)acrylate structural unit (a) is from 65 to 80 mol % relative to the total of all the structural units in (A).

Provided is a process for producing isocyanates from carbamic acid esters which comprises thermally decomposing carbamic acid esters in the presence of a catalyst containing at least one compound selected from the group consisting of organic sulfonic acids and alkaline metal salts of organic sulfonic acids. Thereby, a high thermal decomposition rate can be provided and isocyanate can be obtained in a high yield.

Process for producing isocyanates

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Osaka, Japan

Toshinari Aoki