Toyo Boseki Kabushiki Kaisha

Toshikiyo Tanaka

Yoshio Katoh

Satoshi Imahashi

Kuniomi Etoh

Hiroshi Yasuda

Takeo Sugiura

Toshihiko Kajima

Ichiro Yoshida

Takeo Kohira

Yoshiyasu Itoh

Hisashi Uhara

A water-resistant and high-strength laminate which comprises a base cloth of woven or knitted cloth obtained by weaving or knitting warps and wefts wherein at least a portion of warps and/or wefts is ultra-high-strength-polyethylene filaments and a majority of the rest is polyester fibers, at least one surface of said base cloth being laminated with a biaxially oriented polyester film through an adhesive layer.

Water-resistant and high-strength laminate

A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerizaton being initiated by a free radical and of chain-propagation, (2) a 2-polycyclic aryl-4,5-diphenylimidazolyl dimer wherein the polycyclic aryl group comprises at least two benzene rings condensed each other and (3) at least one compound selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet, indoxylic acid, rhodanine, 7-di(lower)alkylaminocumarine and diarylthiourea and their derivatives, the molar ratio of the component (2) and the component (3) being from 2:1 to 1:5.

Photosensitive resin composition

An image reproducing material comprising a supporting sheet bearing a metal or metallic compound layer having a thickness of 100 to 1000 .ANG. and a photosensitive resin layer, which is characterized in that said photosensitive resin layer contains (1) an ethylenically unsaturated compound which is polymerizable by the action of free radical and chain propagative, (2) a compound showing photochromism by radical mechanism, (3) a free radical producing agent and (4) an acitinic light absorber. There is also provided an image formed (reproduced) material obtained by patterned exposing the above image reproducing material and then processing the same, a method for obtaining such image formed material and also a method for dot-etching such image formed material. By the use of these materials and methods, dot-etching can be effected easily and there are obtained sharp images without the formation of pin holes.

Image forming material and method

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Toyonaka, Japan

Toshikiyo Tanaka