Canon Kabushiki Kaisha

Toshiki Iwai

Takamitsu Komaki

Tomokazu Taki

Ryo Sasaki

Yasuyuki Unno

Kazuhiko Mishima

Hironori Maeda

Nozomu Hayashi

Ken Minoda

Ken-ichiro Shinoda

Kenji Yaegashi

Kohei Senshu

Hiroyuki Matsuda

Device detects a relative position between first and second marks arranged to be superimposed The device includes illumination system to illuminate the first and second marks with first illumination light, first detection system including first image sensor and first aperture stop and configured to form images of diffracted lights from the first and second marks illuminated with the first illumination light on the first image sensor via the first aperture stop, and processor to obtain the relative position between the first and second marks. The first illumination light forms first light intensity distribution asymmetric with respect to the optical axis of the illumination system on pupil surface of the illumination system, or the first aperture stop is asymmetric with respect to the optical axis of the first detection system.

Detection device, detection method, lithography apparatus, and article manufacturing method

The present invention provides a detection apparatus for detecting a position of a detection target including a diffraction grating pattern, comprising: an illuminator configured to illuminate the detection target with illumination light including a plurality of wavelengths; a wavelength selector including an incident surface on which diffracted light from the detection target is incident, and configured to select light of a specific wavelength from the diffracted light; and a detector configured to receive the light of the specific wavelength selected by the wavelength selector and detect the position of the detection target, wherein positions on the incident surface where light components of the plurality of wavelengths included in the illumination light are incident are different from each other, and wherein the wavelength selector controls each of the plurality of elements in accordance with the position on the incident surface.

Detection apparatus, lithography apparatus, and article manufacturing method

Provided is a detection apparatus having a high detection accuracy. A detection apparatus comprises an optical element arranged at a position optically conjugate to a target surface, including a first region for forming illumination light that illuminates the target surface with a first angle distribution and a second region for forming illumination light that illuminates the target surface with a second angle distribution, a measurement mark arranged at the target surface; and a detector for detecting a deviation direction and a deviation amount of the optical element based on reflection light from the measurement mark illuminated by the first region and the second region of the optical element.

Detection apparatus, lithography apparatus, article manufacturing method, and detection method

Provided is a position measurement apparatus in which a measurement error in a target is reduced. A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.

Position measurement apparatus, overlay inspection apparatus, position measurement method, imprint apparatus, and article manufacturing method

A measurement device for measuring a relative position between alignment marks includes an illumination unit capable of illuminating the alignment marks at a plurality of wavelengths, a detection unit that detects light from the alignment marks, a processing unit that obtain the relative position between the alignment marks, and an adjustment unit that adjusts a relative amount between light amounts of the plurality of wavelengths so that a relative value between detection light amounts of light from the alignment marks falls within a predetermined range.

Measurement device, imprint apparatus, method for manufacturing product, light amount determination method, and light amount adjustment method

A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

Detection device, imprint apparatus, planarization device, detection method, and article manufacturing method

The present invention provides an imprint apparatus including a control unit configured to perform detection process, wherein the detection process includes first process in which a detection optical system is caused to detect a mold-side mark in a state in which a substrate state is positioned such that a reference mark is located outside the field of view of the detection optical system, and second process in which the detection optical system is caused to detect the reference mark in a state in which the mold stage is positioned such that the mold-side mark is out of focus with respect to the detection optical system, and the substrate stage is positioned such that the reference mark is located inside the field of view of the detection optical system.

Imprint apparatus, imprint method and method of manufacturing an article

An exposure apparatus and a fabrication method thereof include an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

Exposure apparatus and device fabrication method

A detector includes an illumination optical system that illuminates a first diffraction grating having a period in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in the second direction different from the period of the first diffraction grating in the second direction. A detection optical system detects diffracted light diffracted by the first diffraction grating and the second diffraction grating. The detection optical system includes a photoelectric conversion element and a guide portion arranged on a pupil plane of the detection optical system. The guide portion guides, to the photoelectric conversion element, the light diffracted by the first diffracting grating and the second diffraction grating. The diffracted light diffracted by the second diffraction grating enters a position different from the guide portion on the pupil plane of the detection optical system.

Detector, imprint apparatus, and article manufacturing method

The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

Growing community of inventors

Utsunomiya, Japan

Toshiki Iwai