Dai Nippon Printing Co., Ltd.

Other

Dai Nippon Printing Co., Ltd. and Nippon Telegraph and Telephone Corporation

Nippon Telegraph and Telephone Corporation

Toshikazu Segawa

Masaaki Kurihara

Tsuyoshi Hotta

Yuko Kuwabara

Kenji Ueda

Yukio Taniguchi

Masachika Watanabe

Masataka Nakazawa

Shingo Nishikawa

Hideaki Morita

Tetsuro Komukai

A method of fabricating a hologram having a pattern made up of pixels in which a photosensitive material for forming a hologram is stacked on either a reflection-type hologram or a transmission type hologram. According to one aspect of the invention, the photosensitive material is stacked on a reflection-type relief hologram and reconstructing illumination light of a given wavelength is struck on the reflection-type relief hologram through the photosensitive material, so that interference fringes produced by interference of the light diffracted from the reflection type relief hologram and the incident light are recorded in the photosensitive material. According to another aspect of the invention, the photosensitive material is stacked on a transmission-type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the volume hologram photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and reference light incident on the photosensitive material are recorded in the photosensitive material. According to a third aspect of the invention, the photosensitive material is stacked on a transmission type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and zero-order transmitted light are recorded in the photosensitive material, and a reflecting layer is provided on a back side of the photosensitive material.

Reflection type diffuse hologram, hologram for reflection hologram color filters, etc., and reflection type display device using such holograms

The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders. In making a mask having a plurality of juxtaposed patterns (P to P ) having a linearly or nonlinearly increasing or decreasing pitch and a uniform groove-strip width ratio, multiple exposure is carried out to minimize difference between the pitch at the joint between patterns having different pitch data and the pitch in each individual pattern.

Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber

A reflection type color display device and a reflection type of direct-view color display device are provided. The reflection type color display device includes a spatial light modulator having a collection of pixels and a controllable transmittance per pixel, with a reflection type hologram color filter located on the back side of the modulator. The reflection type of direct-view color display device includes a hologram color filter which has an array of light-collecting holograms. Each of the light-collecting holograms has its own hologram color filter, reflection type hologram, and transmission type spatial light modulator located between the hologram color filter and the reflection type hologram.

The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage with a phase mask blank placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves or strips in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams , whereby the entire area of the phase mask blank to be written is continuously written.

Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask

The invention relates to an optical fiber-processing phase mask which enables a phase mask with a groove pitch varying in a position-dependent manner to be easily obtained by electron beam writing, and its fabrication method. In the optical fiber-processing phase mask comprising on one surface of a transparent substrate a repetitive pattern of grooves (,) and strips (,) located in a grating form, so that an optical fiber is irradiated with diffracted light according to the repetitive pattern to make a diffraction grating in said optical fiber by an interference fringe of diffracted light of different orders, a plurality of patterns (A,to A,) having a linearly or nonlinearly increasing or decreasing pitch are juxtaposed, with a constant width ratio between the grooves (,) and the strips (,). The phase mask is fabricated by carrying out writing while the groove-and-strip patterns with a different pitch are juxtaposed.

Phase mask for processing optical fibers and method of manufacturing the same

The invention relates to a diffraction grating-forming phase mask which can make the diffraction grating to be formed substantially free of any defect, even when foreign matters or resins, etc. sublimed from an optical fiber are deposited on the surface of the phase mask. The phase mask,comprises a substrate and a grating form of repetitive groove (,)-and-strip (,) pattern for forming a diffraction grating by interference fringes of diffracted light through the repetitive pattern. An optically transparent protective layer,is applied over the surface of the substrate with the repetitive groove (,)-and-strip (,) pattern formed thereon.

Phase mask for manufacturing diffraction grating, and method of manufacture

A holographic optical element or other similar molded article using glass as a substrate is improved in the adhesion between the glass substrate and a resin layer formed thereon so that neither peeling nor change of properties will occur. A holographic optical element (4) is adapted to generate interference fringes of the same pitch as that of tracks formed on a magnetic recording disk or repeated patterns formed on an encoder by interference between two light beams emerging from two different holographic lens regions. The holographic optical element (4) includes a glass substrate (3), a radiation-cured resin layer (2) having a hologram relief pattern on the surface thereof, and a silane coupling agent layer (5) provided between the glass substrate (3) and the radiation-cured resin layer (2).

Growing community of inventors

Tokyo, Japan

Toshikazu Segawa