Mitsui Chemicals, Inc.

Toshikazu Sakamaki

Mai Kimura

Kouya Kojima

Hirohisa Shiode

Hiroki Murai

Takaaki Hayashi

Suguru Endo

Takashi Koura

Eiji Kobayashi

A photocurable composition, wherein: in a case in which a rectangular sheet-like test piece Pwith a length of 40 mm, a width of 10 mm, and a thickness of 0.5 mm is produced by photomodeling under specific conditions, and a storage modulus is measured for the thus produced test piece Pby dynamic viscoelastic measurement with a measurement frequency of 1 Hz while increasing a temperature in a range of from 25° C. to 300° C. at a rate of 3° C./min, the storage modulus at 135° C. is 3.0×10Pa or more.

Photocurable composition, three-dimensional modeling product, and dental product

The present invention provides a photocurable composition for use in stereolithography, the photocurable composition including: a (meth)acrylic monomer (X) that is at least one selected from the group consisting of di(meth)acrylic monomers containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and that has a weight average molecular weight of from 400 to 580; a (meth)acrylic monomer (D) that is at least one selected from the group consisting of (meth)acrylic monomers containing, within one molecule, at least one aromatic ring and one (meth)acryloyloxy group, and that has a weight average molecular weight of from 140 to 350; and a photopolymerization initiator.

Photocurable composition, denture base, and plate denture

A photocurable composition includes a photopolymerizable component and a photopolymerization initiator. When a test piece with 39 mm length, 8 mm width, and 4 mm thickness, is produced by photofabrication under conditions in which the photocurable composition is irradiated with visible light having 405 nm wavelength at 12 mJ/cmirradiation dose to form a cured layer with 100 m thickness, the cured layer is stacked in a thickness direction thereof to form a rectangular fabrication product with 39 mm length, 8 mm width, and 4 mm thickness, and the fabrication product is irradiated with ultraviolet rays having 365 nm wavelength at 10 J/cmirradiation dose to produce the test piece, a total fracture work of the test piece measured in compliance with ISO20795-1:2008 is 1100 J/mor more.

Photocurable composition, cured product, and dental product

A photocurable composition for manufacturing a dental prosthesis by stereolithography, including: a photopolymerization initiator; and a (meth)acrylic monomer component including an acrylic monomer (X) having no aromatic rings and having a ring structure other than an aromatic ring and two or more acryloyloxy groups in one molecule and having an Mw of from 200 to 800, and at least one of a (meth)acrylic monomer (A) having one or more ether bonds and two (meth)acryloyloxy groups in one molecule and having a defined Mw, a (meth)acrylic monomer (B) having a ring structure other than an aromatic ring and one (meth)acryloyloxy group in one molecule and having a defined Mw, a (meth)acrylic monomer (C) having a hydrocarbon skeleton and two (meth)acryloyloxy groups in one molecule and having a defined Mw, and a (meth)acrylic monomer (D) having one or more aromatic rings and one (meth)acryloyloxy group in one molecule and having a Mw.

Provided is a photocurable composition including a monomer component including: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700; and a photopolymerization initiator. The composition has a functional group value (a) of from 0.5&#xd7;10to 2.0&#xd7;10mol/g.Functional group value ()=()&#xd7;&#x2003;&#x2003;Formula (a)wherein nrepresents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H); Mrepresents the Mw of the (meth)acrylic monomer (H); and Prepresents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.

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Tokyo, Japan

Toshikazu Sakamaki