Hitachi-high-technologies Corporation

Toshikazu Kawahara

Atsushi Miyamoto

Naoki Hosoya

Hitoshi Komuro

Akihiro Onizawa

Hiromi Fujita

In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (), multiple data for matching are created for each alignment pattern (), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image () based on an image signal from the optical microscope (), and the amount of position shift and the amount of rotation of the wafer are calculated () on the basis of the results of matching ().

Global alignment using multiple alignment pattern candidates

There is provided a recipe generation apparatus and method for reducing the time required to reflect an optimal value and changed value in an input file by automatically reflecting a value obtained by optimizing an input file for recipe generation in the input file for recipe generation. This invention eliminates the inconvenience of manually reflecting changes in an input file for recipe generation by automatically reflecting changed values in the input file for recipe generation after editing a provisionally generated off-line recipe and achieves a reduction in processing time. This invention also provides a method for automatically generating an off-line recipe and a file for recipe generation from a recipe of a scanning electron microscope (see FIG.).

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Hitachinaka, Japan

Toshikazu Kawahara