Shin-etsu Quartz Products Co., Ltd.

Heraeus Quarzglas Gmbh

Toshikatu Matsuya

Heinz Fabian

Shigeru Yamagata

Kyoichi Inaki

Stephan Thomas

Ralf Takke

The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

Optical members and blanks of synthetic silica glass and method for

Optical members and blanks or synthetic silica glass and method for

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Kohriyama, Japan

Toshikatu Matsuya