Panasonic Intellectual Property Management Co., Ltd.

Shionogi Company Limited

Banyu Pharmaceutical Co. Ltd

Merck + Co., Inc.

Panasonic Corporation

Merck Sharp + Dohme Corp.

Msd K.k.

Mitsubishi Electric Corporation

Toshihiro Wada

Shogo Okita

Toshiaki Mase

Manabu Katou

Mitsuru Hiroshima

Steven A Weissman

Syouzou Watanabe

Kenji Maeda

Ralph P Volante

Noriyuki Matsubara

David M Tschaen

Yuruki Okada

Sho Shiraga

Yoshikazu Sasaki

Naoki Ohyabu

Makoto Ishikawa

Atsushi Harikai

Shoji Yoshioka

Nobuaki Nonoyama

Shinji Kato

Nagaaki Sato

Yoshiyuki Wada

Tsuyoshi Nagase

Shigeru Tokita

Yuji Haga

Naotake Kobayashi

Robert Wenslow

Eiichi Kojima

Yuusuke Tamura

Yaling Wang

Takehiko Iida

Naoaki Takeda

Hiromi Asakura

Yuji Nishiura

Masafumi Iwatsu

Keisuke Miyazaki

Takahiro Miyai

Kana Kurahashi

Matthew Heileman

Hiroki Sato

Kenichi Asakawa

Hidekazu Takahashi

Aaron J Moment

Takatsugu Inoue

Toshiyuki Takasaki

Yu Hinata

Russell R Ferlita

Mitsuhiro Okune

Yusuke Tateno

Shiho Ishikawa

Yutaka Tomida

Hisaki Kojima

Nobuya Satake

Masataka Fumoto

Tomomi Urabe

Hideo Kanou

Robert M Wenslow

Keisuke Kamei

Kazuki Shigemori

Kentarou Asahi

Masahide Ohdan

Seiya Nagano

A disclosed plasma processing apparatusincludes: a chamberhaving an opening; a stagedisposed in the chamber, the stage for placing an object to be processed; a dielectric memberclosing the opening; and a plasma generation unitdisposed on the opposite side to the chamberwith reference to the dielectric member, and configured to, when applied with a high-frequency power, generate a plasma in the chamber. The plasma generation unithas a first coilincluding one or a plurality of first conductorsconnected in parallel with each other, and a second coildisposed so as to surround the first coiland including a plurality of second conductorsconnected in parallel with each other. The number of the second conductorsis greater than the number of the first conductors

Plasma processing apparatus

The present invention provides a compound represented by a following formula. A compound represented by, wherein

Dihydropyrazolopyrazinone derivative having MGAT2 inhibitory activity

Disclosed is a plasma processing apparatusincluding a chamber, a stage, a dielectric member, a cover, a gas introduction path, and an induction coil. The induction coilincludes a first induction coilinstalled so as to overlap a central region Rof the dielectric member, and a second induction coilinstalled so as to overlap a peripheral region Routside the central region Rof the dielectric member. The coverhas a first gas holeformed at a position overlapping the central region Rand a second gas holeformed at a position overlapping the peripheral region R. The gas introduction pathhas a first gas introduction pathcommunicating with the first gas holeand a second gas introduction pathcommunicating with the second gas hole

Plasma processing apparatus and method for using plasma processing apparatus

A plasma processing apparatusincluding: a chamberhaving a dielectric window; a coilplaced outside the chamber so as to face the dielectric window; a FS electrodehaving a plate shape and placed on the chamber side of the coil; a first power sourcefor supplying a high-frequency power of a first frequency to the coil; a second power sourcefor supplying a high-frequency power of a second frequency which is different from the first frequency, to the FS electrode; a first matcherplaced between the first power source and the coil; a second matcherplaced between the second power source and the FS electrode; and a first frequency attenuation filter connected between the second matcher and the FS electrode, and configured to allow transmission of the high-frequency power of the second frequency and inhibit transmission of the high-frequency power of the first frequency.

A plasma processing apparatus that performs plasma processing to a substrate held on a transport carrier including a frame and a holding sheet that covers an opening of the frame includes: a transport mechanism that transports the transport carrier; a position measuring section that measures a position of the substrate to the frame; a plasma processing section that includes a plasma processing stage on which the transport carrier is loaded and a cover that covers the frame and a part of the holding sheet loaded on the plasma processing stage, and has a window section for exposing a part of the substrate; and a control section that controls the transport mechanism such that the transport carrier is loaded on the plasma processing stage to satisfy a positional relationship between the window section and the substrate based on the position information of the substrate to the frame.

Plasma processing apparatus and plasma processing method

Provided is a compound which is useful as an AMPK activator, represented by formula: 

5-substituted benzimidazole and 5-substituted azabenzimidazole derivative both having AMPK activation effect

The purpose of the present invention is to provide novel compounds having ACC2 selective inhibitory activity. In addition, the present invention provides a pharmaceutical composition comprising the compound. A compound of Formula:  

9-membered fused ring derivative

The object of the present invention is to provide novel compounds having ACC2 inhibiting activity. In addition, the object of the present invention is to provide a pharmaceutical composition comprising the compound. A compound of formula (I): 

Alkylene derivatives

A compound of formula: or its pharmaceutically acceptable salt. L is NRR, SR, SOR, alkyl, or alkenyl; Ris hydrogen, alkyl, alkenyl, or alkynyl; Ris hydrogen, alkyl, alkenyl, alkynyl; Ris hydrogen, alkyl, alkenyl, or alkynyl; Ris hydrogen, alkyl, alkenyl, or alkynyl, provided that Ris not unsubstituted methyl or trifluoromethyl; Y is alkyl, alkenyl, alkynyl, aryl, provided that Y is not unsubstituted methyl or unsubstituted ethyl; Z is &#x2014;CR&#x2550;, or &#x2014;N&#x2550;; Ris hydrogen, or alkyl; R, Rand Rare each independently hydrogen, halogen, hydroxy, cyano, nitro, carboxy, alkyl, alkenyl, or alkynyl.

Heterocyclic derivative having AMPK-activating activity

Provided is a plasma treatment method including: placing a substrate carrier holding a substrate on a stage; adjusting a distance between a cover and the stage to a first distance in which the cover covers a frame without coming into contact with the substrate carrier; performing a plasma treatment on the substrate placed on the stage after the adjusting of the distance; carrying the substrate together with the substrate carrier out from a reaction chamber after the performing of the plasma treatment; and removing an adhered substance adhered to the cover by generating plasma in the inside of the reaction chamber after the carrying of the substrate, in which the distance between the cover and the stage in the removing of the adhered substance is a second distance greater than the first distance.

Plasma treatment method and method of manufacturing electronic component

In a plasma processing apparatus, thrust-up pins are elevated and a thrust-up force is detected when electrostatic attraction for a substrate by a substrate holding device is ceased after completion of plasma processing, the elevation of the thrust-up pins is ceased upon detection of a detection threshold, and a stepped elevating operation in which the elevation and stoppage of the thrust-up pins are repeated a plurality of times are thereafter commenced on condition that the detected thrust-up force falls to or below the detection threshold and that release of the substrate from a placement surface has not been completed. In the stepped elevating operation, operation timing of the thrust-up device is controlled so that the completion of the release of the substrate from the placement surface is detected when the thrust-up pins are stopped after being elevated and so that the stepped elevating operation is continued on condition that the release has not been completed.

Disclosed is a substance having an antagonistic effect on the binding of histamine to a histamine H3 receptor or an inhibitory effect on the activity which a histamine H3 receptor constantly exhibits. A compound represented by the formula (I) or a pharmaceutically acceptable salt thereof; (I) wherein R1 represents a phenyl group which may be substituted or the like and R2 represents a cyano group which may be substituted or the like, or R1 and R2 together form an aliphatic heterocylic ring which may be substituted; R3 represents a group represented by the formula (II-1) below; and all of X1 to X4 represent a carbon atom or the like: (II-1) where R4 and R5 represent a lower alkyl group or the like; and m1 represents an integer of 2 to 4.

Piperidine derivative

The present invention relates to a process for producing crystalline trans-N-[1-(2-fluorophenyl)-S-pyrazoly]-3-ox-ospiro[6-azaisobenzofuran-1(3H),1'-cyclohexane]-4&#x2032;-carboxamide and novel salts, hydrates and polymorphs thereof.

Synthesis and crystalline forms of NPY5 antagonist

This invention relates to a process for making spirolactone compounds analogous to formula I. 

Process for making spirolactone compounds

A method by which a halogen atom of a halogen compound can be efficiently replaced with an electrophilic group. Also provided are: a reagent for converting a functional group through a halogen-metal exchange reaction, characterized by comprising either a mixture of a magnesium compound represented by the formula R&#x2014;Mg&#x2014;X (I) (wherein Rrepresents a halogen atom or an optionally substituted hydrocarbon residue; and Xrepresents a halogen atom) and an organolithium compound represented by the formula R&#x2014;Li (II)(wherein Rrepresents an optionally substituted hydrocarbon residue) or a product of the reaction of the magnesium compound with the organolithium compound; and a process for producing with the reagent a compound in which a halogen atom of a halogen compound has been replaced with an electrophilic group.

Process for exchanging functional groups by halogen-metal exchange reaction

Growing community of inventors

Osaka, Japan

Toshihiro Wada