Toto Ltd.

Hitachi-High-Technologies Corporation

Totoltd.

Toshihiro Aoshima

Junichi Iwasawa

Makoto Hayakawa

Koichi Hayashi

Mitsuyoshi Machida

Atsushi Kitamura

Tomoyasu Ichiki

Masami Ando

Hirotaka Ishibashi

Katsuhiro Kawakami

Kaduko Ishikawa

Junji Yonezawa

Masaaki Ito

Satoshi Horiuchi

Sukehiro Ito

Shinichi Tomita

Takuma Wada

Hiroaki Ashizawa

Ryoto Takizawa

Yoshihide Hayashida

Yuuki Takahashi

Atsushi Kinjo

Yuta Ebine

According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

Plasma-resistant member

Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.

Composite structure, semiconductor manufacturing apparatus and display manufacturing apparatus provided with composite structure

It is an object of the present invention to provide a back scattered electron detector suitable for implementing a method for determining beforehand in which region of a sample an X-ray detector can obtain an accurate X-ray detection image and perform an appropriate analysis. A Coax-BSE detector which is a back scattered electron detector includes a BSE element, a support member that supports the BSE element, and a fixing member to fix the support member to the X-ray detector, in which the fixing member fixes the support member by clamping a side portion on the distal end side which is an X-ray receiving side of a housing that covers the X-ray detector.

Back scattered electron detector

In order to provide a charged-particle radiation apparatus capable of evaluating and distinguishing the analysis position in a sample subjected to X-ray analysis in the stage before performing X-ray elemental analysis, and also making it possible for an analyst to perform, in a short period of time and without reworking, analysis for which high reliability is ensured, the present invention provides a charged-particle radiation apparatus provided with an X-ray detector, wherein a first back scattered electron detector () on the same axis as the X-ray detection surface of the X-ray detector ((-)) is disposed integrally with or independently from the X-ray detector (), an X-ray signal being detected by the X-ray detector () simultaneously with or separately from detection of a back scattered electron signal by the first back scattered electron detector ().

Charged-particle radiation apparatus

An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.

Electrostatic chuck

An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and a method for manufacturing the electrostatic chuck is provided.

Electrostatic chuck and method of manufacturing electrostatic chuck

A sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body. The surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m as measured with a stylus type surface roughness tester according to JIS B 0651-1996.

Sanitary ware and process for producing the same

Sanitary wares having a controlled surface are disclosed which are less likely to be stained or soiled and/or possess excellent gloss. The first sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m. This sanitary ware is advantageous in that stains or soils are much less likely to be adhered to the surface thereof and, even when adhered to the surface thereof, can be removed by a weak water stream. The second sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a kurtosis Rku of less than 2.70. This sanitary ware advantageously possesses excellent surface gloss. The third sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface of the surface glaze layer consists essentially of a vitreous component and is free from silica particles having a particle diameter of not less than 10 &mgr;m. This sanitary ware is advantageous in that stains or soils are less likely to be adhered to the surface thereof.

Growing community of inventors

Kitakyushu, Japan

Toshihiro Aoshima