Adeka Corporation

Toshihiko Murai

Masatomi Irisawa

Kenji Hara

Daisuke Sawamoto

Yoshie Makabe

Mitsuo Akutsu

Shohei Fujita

Yasunori Kozaki

Provided are: a pattern-forming method by which a laminate that has excellent interlayer adhesion of a resist film, yields a high-definition pattern and exhibits excellent gas barrier properties and high solvent resistance is obtained; and an electronic device produced by the same. The pattern-forming method includes: the step (1) of forming a film using a composition on a support; the exposure step (2) of irradiating a prescribed part of the thus formed film with an active energy ray to modify the developability of the prescribed part; and the development step (3) of developing the film to obtain a pattern, wherein, a plurality of compositions that differ in solubility to a developing solution are used as the composition, and the resulting pattern has a multilayer structure.

Pattern formation method and electronic device manufactured using same

Disclosed are a novel sulfonic acid derivative compound and a novel naphthalic acid derivative compound with high solubility in organic solvents, good photosensitivity, and suitability as a photoacid generator and a polymerization initiator. The sulfonic acid derivative compound is represented by the formula (I) (wherein R, R, R, and Rrepresent a hydrogen atom; any one of Rand Rrepresents an alkoxy group having a carbon number of 4 to 18 which may be substituted with an alicyclic hydrocarbon group, a heterocyclic group, or a halogen atom and which may have a branch, or the like; and Rrepresents an aliphatic hydrocarbon group having a carbon number of 1 to 18 which may be substituted with a halogen atom and/or an alkylthio group, or the like).

Sulfonic acid derivative compound and novel naphthalic acid derivative compound

An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R, R, and Reach independently represent R, OR, COR, SR, CONRR', or CN, wherein R and R&#x2032; each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R&#x2032; may form a ring. Yrepresents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.)

Oxime ester compound and photopolymerization initiator containing such compound

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Tokyo, Japan

Toshihiko Murai