Matsushita Electric Industrial Co., Ltd.

Tabuchi Electric Co., Ltd.

Toshihide Tabuchi

Takenori Kunimi

Masakatsu Tsumura

Nobuhiro Tada

Hiroshi Ikezaki

A reactor is provided in which coil segments (--) of each of first and second auxiliary winding elements (--) is of a multilayered and aligned winding structure. The coil segments (--) of the first auxiliary winding element (-) and the coil segments (--) of the second auxiliary winding element (-) are disposed within respective space areas (--) delimited between the coil segments of the second auxiliary winding element and an outside and between the outside and the coil segments of the first auxiliary winding element. The coil segments of each of those first and second auxiliary winding elements are so combined as to be adjacently alternately positioned in a line to thereby form a main winding body (). The pair of the auxiliary winding elements are connected parallel to each other.

Reactor

A printing substrate having a spiral recess filled with conductive paste is placed on an insulation substrate. The conductive paste is transferred onto the insulation substrate, and is then sintered with the insulation substrate to form a coil pattern on a single surface of the insulation substrate. A non-magnetic section of non-magnetic material is formed around the coil pattern. The inductor device having above configuration has excellent attenuation characteristics in a high frequency band, while having a low profile because of a thinner magnetic section.

Inductor part, and method of producing the same

In a band pass filter having a plurality of helical resonators each including a quarter-wavelength winding, at least two of the helical resonators are substantially shielded from each other by a partition wall, while the corresponding two quarter-wavelength windings which are shielded from each other are electrically connected to each other through a lead line which is insulated from the shield casing, thereby improving the cut off characteristic of the filter to cut off the applied signal more rapidly in the high frequency region of the band being filtered than in the low frequency region.

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Osaka, Japan

Toshihide Tabuchi