Kabushiki Kaisha Toshiba

Tokyo Shibaura Denki Kabushiki Kaisha

Toshiharu Higuchi

Takashi Sudo

Kazuo Kobayashi

Sadao Matsumoto

Osamu Nakamura

Katsuhisa Homma

Kiyomi Koyama

Yoshiaki Ouchi

Yukio Takanashi

Toru Yakabe

Eiichirou Uda

Sakae Kimura

Eiji Yamamoto

Shouji Nakayama

Shigeo Kanda

Akihito Hara

Hideharu Takahashi

Shinpei Koshigoe

Touru Yakabe

Takumi Fujiuchi

There is provided an impregnated-type cathode substrate comprising a large particle diameter low porosity region and a small particle diameter high porosity region which is provided in a side of an electron emission surface of the large particle diameter low porosity region and has an average particle diameter smaller than an average particle diameter of the large particle diameter low pore region and a porosity higher than a porosity of the large particle diameter low porosity region, the impregnated-type cathode being impregnated with an electron emission substance.

Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region

Cathode assembly, electron gun assembly, electron tube, heater, and

Impregnated type cathode assembly, cathode substrate for use in the

A method of forming a coating on an electron emitting cathode, in which (1) a black coating is formed on the inner surface of a cathode sleeve constituting the electron emitting cathode, (2) the cathode sleeve is filled with a suspension as a coating material, and (3) a porous absorbent member is brought into contact with or near an opening portion of the cathode sleeve at the same time or after the cathode sleeve is filled with the suspension, thereby causing the porous absorbent member to absorb an unnecessary portion of the suspension. Thereafter, the cathode sleeve to which the coating material is adhered is heat-treated. As a result, a black coating having a uniform thickness is formed, on the inner surface of the cathode sleeve, as a sintered layer obtained by mixing tungsten having an average particle diameter in a range of 0.5 .mu.m (inclusive) to 2 .mu.m (inclusive) with alumina having an average particle diameter in a range of 0.1 .mu.m (inclusive) to 1 .mu.m (exclusive) at a weight ratio of the tungsten to the alumina in a range of (90:10) to (65:35).

Method of manufacturing a cathode assembly

A black coating having a uniform thickness is formed, on the inner surface of the cathode sleeve, as a sintered layer obtained by mixing tungsten having an average particle diameter in a range of 0.5 .mu.m (inclusive) to 2 .mu.m (inclusive) with alumina having an average particle diameter in a range of 0.1 .mu.m (inclusive) to 1 .mu.m (exclusive) at a weight ratio of the tungsten to the alumina in a range of (90:10) to (65:35).

Cathode assembly incorporating a black layer formed from particles

An indirectly heated type cathode assembly comprises a cathode sleeve having a heater within itself and having an emitter-impregnated type cathode disc fitted at one end, a plurality of straps connected at one end to a lower end portion of the cathode sleeve, and a cylinder holder whose upper end is connected to the other end of each strap, the holder being located outside the cathode sleeve such that it is spaced a predetermined distance apart from the cathode sleeve. A heat reflecting cylinder is located between the cathode sleeve and the holder of the indirectly heated type cathode assembly such that it is coaxial with the cathode sleeve and holder. The heat reflecting cylinder is supported by the holder and each strap extends such that it is not in contact with the heat reflecting cylinder. The strap is made of a Ta-W alloy or a Ta-W-Hf alloy. An electron gun structure comprises the indirectly heated type cathode assembly, a first grid placed in front of the indirectly heated type cathode assembly and an insulation support into which the first grid and the holder of the indirectly heated type cathode assembly are embedded partially and directly through a securing piece, respectively. The cathode disc is hidden, by a heat reflecting cylinder, from view at least that portion of the insulating support which is defined between an embedded spot of the first grid and that of the securing piece.

Indirectly heated cathode assembly and its associated electron gun

A cathode structure includes a thermal conductive member, a heater for heating a thermal conductive member, a metal substrate having a first surface facing a thermal conductive member and a second surface and attached to the thermal conductive member to form a space between a central portion of a second surface and the thermal conductive member, and an electron emitting member provided on a second surface of a metal substrate.

Cathode structure for electron tube

Disclosed is a directly heated cathode assembly for a cathode ray tube electron gun, comprising

Directly heated cathode assembly

A directly heated type cathode assembly comprises a ribbon filament to a substantially central portion of which an electron-emitting substance is attached through a metal plate, a first support member on which one end portion of the ribbon filament is fixed to support the ribbon filament, the first support member being electroconductive, a second support member for supporting that portion of the ribbon filament which is a little short of the other end of the ribbon filament, a conductive spring member fixed to the other end portion of the ribbon filament, and a conductive cathode cylinder supporting the first support member, second support member and spring member and having a base at the filament side, the base of the cylinder having at least one opening.

Directly heated type cathode assembly

Growing community of inventors

Yokohama, Japan

Toshiharu Higuchi