Sharp Kabushiki Kaisha Corporation

Toshifumi Yagi

Toshihide Tsubata

Masanori Takeuchi

Tsuyoshi Tokuda

Kenji Enda

Yoshinori Shimada

Tomoki Noda

Yuhko Hisada

Meng-Yi Hung

Hidetoshi Nakagawa

Nobuyoshi Nagashima

Masahiro Matsuda

Akira Yamaguchi

Kazushige Miyamoto

Akihiro Shohraku

Takuya Ohishi

Yoshinori Kinai

Tomofumi Kubota

Ryuji Kurihara

Haruhisa Suzuki

Shinya Maruoka

A liquid crystal display device includes first and second substrates and a vertically-aligned liquid crystal layer. The first substrate includes a pixel electrode and a first alignment film. The second substrate includes a counter electrode and a second alignment film. The first alignment film has, within each pixel, first and second pretilt regions that define first and second pretilt directions, respectively, that are antiparallel to each other. The second alignment film has, within each pixel, third and fourth pretilt regions that define third and fourth pretilt directions, respectively, that are antiparallel to each other. At least either a surface of the first substrate or a surface of the second substrate has a groove formed so as to overlap at least either a boundary between the first and second pretilt regions or a boundary between the third and fourth pretilt regions when seen from a direction normal to a display surface.

Liquid crystal display device

An active matrix substrate includes a peripheral circuit including a first TFT disposed in a non-display region and a capacitance portion, and a lower transparent electrode and an upper transparent electrode disposed in each pixel. The active matrix substrate includes a gate metal layer including a gate electrode of the first TFT, a source metal layer including a source electrode of the first TFT, a lower transparent conductive layer positioned above the gate metal layer and the source metal layer and including the lower transparent electrode, and an upper transparent conductive layer including the upper transparent electrode. The capacitance portion includes a first capacitor including a first lower capacitance electrode formed in the lower transparent conductive layer, a first upper capacitance electrode formed in the upper transparent conductive layer, and a portion positioned between these capacitance electrodes in a dielectric layer.

Active matrix substrate and display device using same

A liquid crystal display device () according to the present invention includes a plurality of pixels arrayed in a matrix, n number of the pixels (n is an even number of 4 or greater) being included in a color display pixel (CP). The liquid crystal display device includes an active matrix substrate () including a plurality of scanning lines () extending in a row direction and a plurality of signal lines () extending in a column direction; and a signal line driving circuit () that supplies, as a display signal, a gray scale voltage of a positive or negative polarity to each of the plurality of signal lines. The plurality of signal lines include a first type of signal line () which does not intersect another signal line, and a second type of signal line () which intersects a signal line adjacent thereto outside a display area in the state where an insulating film () is interposed therebetween. The active matrix substrate further includes a correction line () which is provided in the vicinity of an intersection region (IR) where the second type of signal line intersects the adjacent signal line, is electrically separated from the plurality of signal lines, and is at a floating potential.

Liquid crystal display device and display defect correction method

An active matrix substrate includes: storage capacitor wirings (); a Cs trunk wiring () connected with the storage capacitor wirings via contact holes () provided in a non-display region (); scanning signal lines () provided in the same layer as the storage capacitor wirings () and crossing the Cs trunk wiring () in the non-display region (); an insulating layer between the storage capacitor wirings () and the Cs trunk wiring () which includes: a through-bore portion for forming the contact hole (); a first film thickness portion () adjacent to the through-bore portion; and a second film thickness portion which is thicker than the first film thickness portion () and situated at least in the intersections of the storage capacitor wirings () with the Cs trunk wiring (). Consequently, the storage capacitor wirings () and the Cs trunk wiring () are connected with high precision, and a short circuit between the Cs trunk wiring () and the scanning signal lines () is unlikely to occur.

Active matrix substrate, liquid crystal panel, display, television receiver

An active matrix substrate () includes a substrate, a TFT () formed on the substrate, a storage capacitor element () formed on the substrate, an interlayer insulating film covering the storage capacitor element (), and a pixel electrode () formed on the interlayer insulating film. The storage capacitor element () includes a storage capacitor line (), an insulating film formed on the storage capacitor line (), and two or more storage capacitor electrodes () opposed to the storage capacitor line () with the insulating film interposed therebetween. The two or more storage capacitor electrodes () are electrically connected via associated contact holes () formed in the interlayer insulating film to the pixel electrode () and electrically continuous with a drain electrode of the TFT ().

Active matrix substrate, method for fabricating active matrix substrate, display device, liquid crystal display device, and television device

The present invention provides an active matrix substrate of comprising on the substrate: a plurality of scanning signal lines and data signal lines; a thin film transistor provided at an intersecting point of the signal lines and comprising a gate electrode connected to the scanning signal line, a source electrode connected to the data signal line; and a pixel electrode electrically connected to a drain electrode of the thin film transistor, wherein the active matrix substrate comprises a structure having an at least partly multilinear data signal line and an interconnection electrode for correction.

Active matrix substrate, method for correcting a pixel deffect therein and manufacturing method thereof

A color filter substrate for a liquid crystal display device includes a color layer, a photo spacer and a counter electrode disposed on the substrate, and an alignment control protrusion is disposed on the counter electrode for controlling alignment of liquid crystal. A manufacturing method for the color filter substrate includes the step of forming an opening by laser irradiation in a region of the counter electrode corresponding to an absent portion occurring in the alignment control protrusion. The manufacturing method is also applicable to an active matrix substrate for a liquid crystal display device. The manufacturing method can effectively correct a defect if one occurs in the alignment control protrusion.

Liquid crystal display device substrate, method of manufacturing liquid crystal display device substrate, liquid crystal display device and method of manufacturing liquid crystal display device

After forming a gate electrode () in a first step, a gate insulating film (), a semiconductor film () and a conducting film () including a transparent conducting film () are stacked, and on the thus obtained multilayered body (), a resist pattern () including a first opening () for exposing the conducting film () therein and a second opening () having a bottom portion (B) above the gate electrode () is formed. Portions of the conducting film () and the semiconductor film () exposed in the first opening () are etched, the bottom portion (B) of the second opening () is removed for exposing the conducting film () therein, and the exposed conducting film () is etched, so as to form a TFT () in a second step. A pixel electrode (), a protection masking layer () and a projection () are formed in a third step.

Method for fabricating thin film transistor array substrate and thin film transistor array substrate

An active matrix substrate includes a thin film transistor, a scanning signal line, and a data signal line disposed on the substrate. A gate electrode of the transistor is connected to the scanning signal line, a source electrode thereof is connected to the data signal line, and a drain electrode thereof is connected to a pixel electrode; and an upper electrode is disposed so as to oppose a storage capacitor wiring pattern at least via an insulating layer. Within a pixel region, the upper electrode includes three divided electrodes in a region opposing the storage capacitor wiring pattern, and a central divided electrode of the three divided electrodes has the smallest area.

Electrodes located at storage capacitor wiring in active matrix substrate

A color filter substrate and a liquid crystal display apparatus include, on a substrate: a colorized layer including color layers; a stacked layer protruding in comparison with the colorized layer; an opposing electrode covering the colorized layer and the stacked layer; an alignment layer formed at least on a part of the opposing electrode covering the colorized layer; and an insulating layer stacked on an entire surface of another part of the opposing electrode covering the stacked layer. With this, the short circuit between the opposing electrode and a pixel electrode is prevented, so that a color filter substrate, a liquid crystal display apparatus including the color filter substrate, and a method of manufacturing the color substrate, those being able to improve the yield of the liquid crystal display apparatus, are provided.

Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate

An active matrix substrate suppresses reduction in production yield and increase in production steps and simultaneously permits both sufficient securing of a storage capacity and improvement of an aperture ratio of a pixel. The active matrix substrate is an active matrix substrate and includes a thin film transistor disposed at an intersection of a scanning signal line with a data signal line on a substrate, the thin film transistor including a gate electrode connected to the scanning signal line, a source electrode connected to the data signal line, and a drain electrode connected to a drain lead-out wiring; a storage capacitor upper electrode connected to the drain lead-out wiring and a pixel electrode; and a storage capacitor wiring overlapping with the storage capacitor upper electrode through an insulating film, wherein the storage capacitor wiring has an extending portion overlapping with the drain lead-out wiring through the insulating film.

Active matrix substrate where a portion of the storage capacitor wiring or the scanning signal line overlaps with the drain lead-out wiring connected to the drain electrode of a thin film transistor and display device having such an active matrix substrate

An active matrix substrate includes a substrate, a TFT formed on the substrate, a storage capacitor element formed on the substrate, an interlayer insulating film covering the storage capacitor element, and a pixel electrode formed on the interlayer insulating film. The storage capacitor element includes a storage capacitor line, an insulating film formed on the storage capacitor line, and two or more storage capacitor electrodes opposed to the storage capacitor line with the insulating film interposed therebetween. The two or more storage capacitor electrodes are electrically connected via associated contact holes formed in the interlayer insulating film to the pixel electrode and electrically continuous with a drain electrode of the TFT.

A method of manufacturing an active matrix substrate prevents an increase in the number of production steps while simultaneously preventing electrostatic discharge at a TFT channel. The method preferably includes the steps of

Production method of active matrix substrate, active matrix substrate, and liquid crystal display device

The present invention is a color filter substrate comprising: a non-laminated part in which a colored layer and/or a transparent layer are arranged in a plane; and a laminated part in which parts of the colored layer and/or the transparent layer are laminated as two or more layers on a substrate, (1) a film thickness of a layer constituting the laminated part is not less than 90% and not more than 110% to a film thickness of a corresponding layer of the non-laminated part and/or (2) the colored layer and/or the transparent layer are formed using a dry film having a solid-phase resist layer having penetration amount in a penetration hardness test at 120&#xb0; C. of not more than 0.5 &#x3bc;m.

Growing community of inventors

Tsu, Japan

Toshifumi Yagi