Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

Other

The University of Tokyo

Toshifumi Honda

Yuta Urano

Yukihiro Shibata

Shunichi Matsumoto

Hirohito Okuda

Ryo Nakagaki

Yuji Takagi

Takahiro Urano

Akira Hamamatsu

Atsushi Miyamoto

Atsushi Taniguchi

Toshiyuki Nakao

Taketo Ueno

Yuko Otani

Masami Makuuchi

Masaki Kurihara

Takashi Hiroi

Sachio Uto

Takahiro Jingu

Takehiro Hirai

Kenji Nakahira

Hisashi Hatano

Eiji Arima

Hidetoshi Nishiyama

Naoki Hosoya

Shigenobu Maruyama

Hideki Fukushima

Nobuhiro Obara

Toshihiko Nakata

Kenji Obara

Hiromichi Yamakawa

Hironori Sakurai

Masaya Yamamoto

Kazuo Aoki

Hiroshi Makino

Yasuhiro Yoshitake

Kei Shimura

Yasuhiko Ozawa

Yukio Matsuyama

Mamoru Kobayashi

Takeru Utsugi

Keiko Oka

Ludwig Listl

Hisae Yamamura

Takanori Kondo

Munenori Fukunishi

Takeyuki Yoshida

Yuuji Takagi

Hisaaki Kanai

Shunji Maeda

Satoru Takahashi

Kaoru Sakai

Tomoto Kawamura

Minoru Harada

Muneo Maeshima

Junguo Xu

Toshiei Kurosaki

Hideki Nakayama

Guenter Doemens

Masashi Sakamoto

Hideaki Doi

Yuki Shimizu

Kohei Yamaguchi

Peter Mengel

Akio Yazaki

Akira Maekawa

Yasuko Aoki

Hiroko Fujita

Toshiro Kubo

Shinya Murakami

Kiyoshi Takamasu

Nobuaki Hirose

Nobuhiko Kanzaki

Kenshiro Ohtsubo

Katsuhiro Kitahashi

Yoshio Kimoto

Hideo Ota

Andreas Karsaklian Dal Bosco

Shigeshi Yoshinaga

Yoshiko Ishida

Provided is a defect inspection apparatus including a plurality of detection optical systems for collecting illumination scattered light from the surface of a sample, a plurality of sensors for converting the illumination scattered light collected by the corresponding detection optical systems into electrical signals and outputting detection signals, and a signal processing device for processing the detection signals input from the plurality of sensors, wherein the signal processing device generates a first signal group including an integrated signal obtained by adding a plurality of detection signals in a predetermined combination based on a group of detection signals input from the plurality of sensors, generates a second signal group by performing the filtering processing on each signal that configures the first signal group, generates a third signal group including separated signals separated according to a predetermined rule from the signal corresponding to the integrated signal based on the second signal group, and detects or classifies defects based on the third signal group to store defect inspection data in a memory.

Defect inspection apparatus and defect inspection method

A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height measuring unit, a deviation amount of the focusing position with respect to the light receiving surface in an optical axis direction of the detection optical system is calculated based on the height variation amount of the illumination spot, the deviation amount of the focusing position being generated accompanying a height variation of the illumination spot, and the focus actuator is controlled based on the deviation amount of the focusing position, and scattered light intensities at the same coordinates of the sample are added.

Defect inspection device

A defect inspection apparatus includes an illumination unit configured to irradiate a surface of a sample with a linear illumination spot; a condensing detection unit configured to condense reflected light of the illumination spot and to control a polarization state of the incident light to form an optical image; and a sensor unit configured to output the optical image and including an array-shaped light receiving portion and an antireflection film at a position conjugate with the illumination spot, in which the condensing detection unit includes a polarization control unit configured to increase light incident efficiency to the sensor unit. The normal line of the light receiving surface of the sensor unit is inclined from the optical axis of the condensing detection unit by 10 degrees or more and less than 80 degrees. The light condensing detection unit increases the optical magnification in the lateral direction of the illumination spot.

A defect inspection apparatus that includes a differential interference contrast illumination system that irradiates a sample surface with an illumination spot set composed of two polarized illumination spots that have different phases at a predetermined wavelength and that are offset by a predetermined shear amount, a differential interference contrast detection system that condenses reflected light beams of the two polarized illumination spots reflected from the sample surface to generate interference light beams, a scanning unit that scans the sample surface using the two polarized illumination spots, a sensor unit that photoelectrically converts the interference light beams generated by the differential interference contrast detection system to generate interference signals, a height displacement measurement unit that processes the interference signals to measure height displacement between the illumination spots, and a height shape reconstruction unit that accumulates height displacement data of the illumination spots and reconstructs a height shape of the sample surface.

Surface inspection device and shape measurement software

A defect inspection device includes: an illumination optical system including a polarization element configured to switch polarization of irradiation light between first polarization and second polarization orthogonal to the first polarization; a polarization diffraction grating configured to emit diffraction light of a specific order of the irradiation light in a direction along a normal line of a sample stage surface, a diffraction efficiency of the specific order of the first polarization of the irradiation light is equal to or less than 20% of a diffraction efficiency of the specific order of the second polarization, the polarization diffraction grating being settable at a light collection position of the irradiation light on the sample stage surface and including an anisotropic pattern whose period is equal to or less than twice a wavelength of the irradiation light; a detection optical system.

Defect inspection device, defect inspection method, and adjustment substrate

A defect inspection device includes an illumination unit that irradiates a sample with a linear illumination spot; a condensing detection unit that condenses reflected light of the illumination spot from the sample; and a sensor unit that forms an optical image on a light reception surface, and outputs the optical image as an electrical signal. An angle α formed between an optical axis of the condensing detection unit and a longitudinal direction of the linear illumination spot is 10° or more and less than 80°. The sensor unit is a line sensor provided with an array-like light reception unit at a position conjugate with the illumination spot. An angle β formed between direction of the line sensor and the optical axis of the condensing detection unit is 10° or more and less than 80°, and has a difference from the angle α of 5° or more.

Defect inspection device and defect inspection method

A defect inspection apparatus including a stand that supports a sample, an illumination optical system that irradiates the sample with illumination light, a scanning device that drives the sample stand to change position, detection optical systems that condense illumination scattered light from a surface of the sample, sensors that convert the condensed light into an electric signal and output a detection signal, a storage device that stores a plurality of feature vectors for each defect type, and a signal processing device that processes detection signals input from the plurality of sensors. The signal processing device calculates a measurement vector that is a feature vector of a defect on the surface of the sample, generates a feature vector of a virtual defect in which a form of the detection defect has been changed, from the actual measurement vector, and accumulates the feature vector of the virtual defect of one instruction defect.

Defect inspection apparatus

A defect inspection apparatus includes a first objective lens having an optical axis is perpendicular to a wafer mounting surface of the stage, a second objective lens having an optical axis forms a predetermined acute angle with respect to the wafer mounting surface of the stage, and a dichroic mirror which reflects light having a first wavelength and transmits or reflects light having a second wavelength. Emitted light of a first optical pathfrom a first light source which is reflected from or transmitted through the dichroic mirror and first emitted light and second emitted light polarized and separated from a second light source which are transmitted through or reflected from the dichroic mirror are incident on the first objective lens, and emitted light of a second optical path from the first light source is incident on the second objective lens.

An object of the invention is to provide a defect inspection device capable of correcting image forming position deviation due to displacement of a sample surface in a Z direction while enabling image forming detection from a direction not orthogonal to a longitudinal direction of illumination. The defect inspection device according to the invention is configured to determine on which lens in a lens array scattered light is incident according to a detection elevation angle of the scattered light from a sample, and an image position of the scattered light having a small elevation angle is corrected more than an image position of the scattered light having a large elevation angle.

This defect inspection device for emitting illumination light onto a moving and rotating sample and inspecting for sample defects by scanning the sample in a spiral shape or concentric circle shapes comprises: an illumination and detection unit comprising an emission optical system and a detection optical system; a rotary stage for rotating the sample; a rectilinear stage for rectilinearly moving the rotary stage; and a controller for controlling the illumination and detection unit, rotary stage, and rectilinear stage. On the linear path of the rectilinear stage are a scanning start position where illumination light is emitted onto the sample and scanning is started and a sample delivery position where movement of the sample to the scanning start position starts. When the sample arrives at the scanning start position, the defect inspection device starts emitting the illumination light onto the sample without waiting for the rotation speed of the rotary stage to rise to a specified rotation speed for scanning and raises the rotation speed of the rotary stage to the specified rotation speed while scanning the sample.

An inspection device includes an illumination optical system that irradiates a sample with light having a predetermined wavelength, a detection optical system that includes a photoelectric conversion unit, and a data processing unit that extracts positional information of a foreign substance or a defect on the sample. The light collection optical system includes a polarized light transmission control unit that changes transmission characteristics according to polarization characteristics of the collected reflected light or scattered light. The polarized light transmission control unit includes a birefringence phase difference control unit that causes a predetermined phase difference between a fast phase axis and a slow phase axis of the reflected light or scattered light according to the polarization characteristics of the reflected light or scattered light, and a polarized light transmission unit that selectively transmits light according to a polarization direction of output light of the birefringence phase difference control unit.

Defect inspection device and inspection method, and optical module

In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.

Defect classification device, inspection device, and inspection system

An inspection device capable of inspecting a foreign matter even during rotation acceleration/deceleration of an object under inspection. The inspection device includes a rotation-and-translation unit configured to rotate and translate the object under inspection; a light intensity modulation unit configured to modulate intensity of laser light to irradiate the object under inspection; a light intensity control unit configured to control the light intensity modulation unit; an object-under-inspection-operation detection unit configured to calculate information about a linear speed at a laser irradiation position on the object under inspection; a data processing unit configured to start foreign matter and defect inspection when a rotation speed of the object under inspection reaches a predetermined speed and a rotation-and-translation control unit configured to determine a time required for a next single rotation of a rotation stage, and apply, to a translation stage, a translation control value for moving the translation stage.

Inspection device and inspection method thereof

A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

The invention includes a pulse oscillated light source, an illumination unit that guides light output from the light source to a sample, a scanning unit that controls a position at which the sample is scanned by the illumination unit, a light converging unit that converges light reflected from the sample, a first photoelectric conversion unit that outputs an electric signal corresponding to the light converged by the light converging unit, an AD conversion unit that converts the electric signal output from the first photoelectric conversion unit into a digital signal in synchronization with pulse oscillation of the light source, a linear restoration unit that processes a digital signal converted by the AD conversion unit in synchronization with a pulse oscillation output by the AD conversion unit and corrects nonlinearity of the first photoelectric conversion unit, a defect detection unit that detects a defect of the sample based on an output of the linear restoration unit, and a processing unit that obtains and outputs a position and a size of the defect detected by the defect detection unit.

Growing community of inventors

Yokohama, Japan

Toshifumi Honda