Other

Mitsubishi Chemical Corporation

Toshiaki Sakakihara

Makoto Ishikawa

Yasuhiro Kawase

Fumikazu Mizutani

Masaki Munakata

Noriyuki Saitou

Satoshi Kumon

Hirohito Komatsu

Masakazu Motoi

Nobuhiro Goda

Kazuma Teramoto

A high-quality oxide film which is free from a pinhole and surface roughing caused by anodic oxidation and which has surface smoothness on a surface of a material to be treated containing a metal as a principal component. An electrolyte solution which is used for forming an oxide film on a surface of a material to be treated containing a metal as a principal component by anodic oxidation, the electrolyte solution containing a non-aqueous solvent containing an alcoholic hydroxyl group and having 4 or more carbon atoms as a main solvent. This non-aqueous solvent preferably contains two or more alcoholic hydroxyl groups and is especially preferably one or two or more members selected from the group consisting of diethylene glycol, triethylene glycol and polyethylene glycol. A method of forming an oxide film including a step of anodically oxidizing a material to be treated containing a metal as a principal component in this electrolyte solution.

Method of forming oxide film by anodically oxidizing in an electrolyte solution

A silver or silver alloy thin layer on a substrate is etched by an etching liquid uniformly without producing an etching residue while avoiding side etching due to over etching. The etching liquid contains silver ions in a range from 0.005 to 1 weight %. The etching liquid is fed to a tank or an etching liquid feeding apparatus, and then brought into contact with the silver or silver alloy thin layer on the substrate.

Etching method and etching liquid

Growing community of inventors

Fukuoka, Japan

Toshiaki Sakakihara