Sii Nanotechnology Inc.

Seiko Instruments Inc

Hitachi High-tech Science Corporation

Nec Corporation

Nippon Telegraph and Telephone Corporation

Nagoya University

Other

Jeol Ltd.

Honda Patents & Technologies North America, LLC

Riken & Sii Nanotechnology Inc.

Toshiaki Fujii

Yasuhiko Sugiyama

Junichi Tashiro

Kouji Iwasaki

Yo Yamamoto

Haruo Takahashi

Xin Man

Tatsuya Adachi

Masakatsu Hasuda

Toshio Doi

Toshio Kodama

Takashi Ogawa

Shinya Shimizu

Masaki Kitahara

Hideaki Kimata

Kazuto Kamikura

Yoshiyuki Yashima

Takashi Kaito

Kazuo Aita

Yutaka Ikku

Masayuki Tanimoto

Yasuyuki Takagi

Mike Hassel-Shearer

Keiichi Tanaka

Hiroyuki Suzuki

Kenji Yamamoto

Takahiro Ochiya

Atsushi Uemoto

Hidekazu Suzuki

Yoshitomo Nakagawa

Hiroshi Yamanouchi

Yoshinobu Aoyagi

Masamichi Oi

Hiroyuki Wada

Masanao Munekane

Takumi Teratani

Mikio Naruse

Kazuhito Tsukagoshi

Masashi Muramatsu

Hiroshi Matsumura

Masashi Iwatsuki

Pascal Brisson

Yusuke Yamamoto

Masao Abe

Kunji Shigeto

Minuru Kawamura

Alekber Yu Kasumov

Mike Hassel Shearer

Atsushi Yamauchi

Hiroshi Sawaragi

Munenori Tasai

A sample processing evaluation apparatus includes a charged particle beam column that irradiates a sample with charged particle beam, a sample holder that holds both ends of the sample, and a sample stage on which the sample holder is placed, in which the sample holder is configured to rotate the sample about a rotation axis between the sample stage and the charged particle beam column.

Sample processing evaluation apparatus

A crystal analysis apparatus includes: a measurement data storage configured to store electron back-scattering pattern (EBSP) data measured at electron beam irradiation points on a plurality of cross-sections of a sample formed substantially in parallel at prescribed intervals; a crystal orientation database configured to accumulate therein information of crystal orientations corresponding to EBSPs; and a map constructing unit that constructs a three-dimensional crystal orientation map based on distribution of crystal orientations in normal directions of a plurality of faces of a polyhedral image having the cross-sections arranged at the prescribed intervals by reading out the crystal orientations in the normal directions of the faces from the crystal orientation database on the basis of the EBSP data stored in the measurement data storage.

Crystal analysis apparatus, composite charged particle beam device, and crystal analysis method

A flight control system loading test apparatus includes a surface-mounted sector, a cam profile sector, a dummy weight, and a cable. The surface-mounted sector attaches to an aircraft flight control system body such that the surface-mounted sector pivots along with the body about a pivot axis. The cam profile sector is configured to rotate about a rotational axis among a plurality of loading positions. The cam profile sector includes a profile surface having a plurality of curves. Each curve follows a different radius emanating from a respective axis substantially parallel to the rotational axis of the cam profile sector. The cable contacts the cam profile sector along the profile surface. An applied hinge moment using the dummy weight varies as the cam profile sector rotates about the rotational axis.

Flight control system loading test apparatus and method

A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.

Cross section processing method and method of manufacturing cross section observation sample

An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam

Electron microscope and specimen analyzing method

A video encoding method for encoding video images as a single video image by using parallax compensation which performs prediction by using parallax between the video images, and a corresponding decoding method. The number of parameters as parallax data used for the parallax compensation is selected and set for each reference image. Data of the set number of parameters is encoded, and parallax data in accordance with the number of parameters is encoded. During decoding, parallax-parameter number data, which is included in encoded data and designates the number of parameters as parallax data for each reference image, is decoded, and parallax data in accordance with the number of parameters is decoded, where the parallax data is included in the encoded data.

Video encoding method and decoding method by using selected parallax for parallax compensation, apparatuses therefor, programs therefor, and storage media for storing the programs

By using parallax compensation which performs prediction by using parallax between video images, the video images are encoded as a single video image. Reference parallax for a target image to be encoded is set, wherein the reference parallax is estimated using a reference image; area division in an image frame is set; parallax displacement for each divided area is set, wherein the parallax displacement is the difference between the reference parallax and parallax for the parallax compensation; data of the area division is encoded; and data for indicating the parallax displacement is encoded. During decoding, reference parallax for a target image to be decoded is set, wherein it is estimated using a reference image; data for indicating area division, which is included in encoded data, is decoded; and data of parallax displacement, which is included in the encoded data, is decoded for each area indicated by the area division data.

Video encoding method and decoding method, apparatuses therefor, programs therefor, and storage media for storing the programs by using parallax compensation

A section processing apparatus has a mark forming control portion that transmits control information for forming marks on a surface of a sample. Each of the marks has at least two portions intersecting at a converging portion located at a previously determined position of an observation target section of the sample or in the vicinity of the previously determined position. A first focused ion beam apparatus emits a first focused beam for forming each of the marks on the surface of the sample based on the control information transmitted by the mark forming control portion and for processing a section of the sample. The section of the sample is processed by scanning the first focused beam in parallel with the at least two portions of the marks in the direction of the converging portion, while the section of the sample and positions of the marks are observed by a second focused ion beam apparatus, and to finish processing of the section of the sample when the first focused beam reaches the converging portion or a vicinity thereof.

Section processing method and its apparatus

A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

Composite focused ion beam device, process observation method using the same, and processing method

There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

Sample processing and observing method

A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

Composite focused ion beam device, and processing observation method and processing method using the same

The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

Apparatus for working and observing samples and method of working and observing cross sections

Objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

Nanobio device of imitative anatomy structure

There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel, an SEM lens-barrel, a gas ion beam lens-barrel, and a rotary sample stagehaving an eucentric tilt mechanism and a rotating shaftorthogonal to an eucentric tilt axis. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam, an electron beamand a gas ion beamintersect at a single point, an axis of the FIB lens-barreland an axis of the SEM lens barrelare orthogonal to the eucentric tilt axis, respectively, and the axis of the FIB lens-barrel, an axis of the gas ion beam lens-barreland the eucentric tilt axisare in one plane.

Composite charged-particle beam system

Growing community of inventors

Chiba, Japan

Toshiaki Fujii