Sii Nanotechnology Inc.

Toshiaki Fuji

Yasuhiko Sugiyama

Kouji Iwasaki

Masakatsu Hasuda

Toshio Kodama

Yasuyuki Takagi

An apparatus has a holder member () which holds a sample (), and a removing beam source () which irradiates an inert ion beam onto a cross section () of the sample () held by a holder member () and removes a fracture layer on the cross section (). Then, the removing beam source () is disposed on the holding end side of the sample () with respect to the normal L of the cross section () so that the irradiating direction of the inert ion beam is tilted at the tilt angle &#x3b8; to the normal L with respect to the cross section ().

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Chiba, Japan

Toshiaki Fuji